Collisional cooling and ablation product dynamics observed by resonant ionization spectroscopy of nascent carbon monoxide from 193 nm laser ablation of polyimide

1989 ◽  
Vol 55 (22) ◽  
pp. 2286-2288 ◽  
Author(s):  
P. M. Goodwin ◽  
C. E. Otis
Keyword(s):  
Carbon Monoxide ◽  
Laser Ablation ◽  
Resonant Ionization ◽  
Ablation Product ◽  
Collisional Cooling ◽  
193 Nm

Assessment of matrix effects associated with Fe isotope analysis using 266 nm femtosecond and 193 nm nanosecond laser ablation multi-collector inductively coupled plasma mass spectrometry

2018 ◽  
Vol 33 (1) ◽  
pp. 68-83 ◽  
Author(s):  
Xin-Yuan Zheng ◽  
Brian L. Beard ◽  
Clark M. Johnson
Keyword(s):  
Laser Ablation ◽  
Inductively Coupled Plasma ◽  
Matrix Effects ◽  
Isotope Analysis ◽  
Nanosecond Laser ◽  
Inductively Coupled ◽  
Nanosecond Laser Ablation ◽  
Plasma Mass Spectrometry ◽  
193 Nm

The nature of matrix effects during in situ Fe isotope analysis using fs- and ns-laser ablation (LA) was characterized and compared.

scholarly journals Laser ablation of nanoscale particles with 193 nm light

2007 ◽  
Vol 59 ◽  
pp. 54-59 ◽  
Author(s):  
J H Choi ◽  
D Lucas ◽  
C P Koshland
Keyword(s):  
Laser Ablation ◽  
Nanoscale Particles ◽  
193 Nm

Argon fluoride LA-LEAF for rapid arsenic quantitation

2017 ◽  
Vol 32 (9) ◽  
pp. 1697-1704 ◽  
Author(s):  
J. A. Merten ◽  
C. A. Jones ◽  
P. D. Tribbett
Keyword(s):  
Laser Ablation ◽  
Detection Limits ◽  
Ablation Plasma ◽  
Laser Ablation Plasma ◽  
193 Nm ◽  
Argon Fluoride

A 193 nm ArF excimer pulse reexcites arsenic atoms in a cooled laser ablation plasma, lowering detection limits over LIBS.

Vacuum Ultraviolet Laser Ablation of Teflon (PTFE)

1992 ◽  
Vol 285 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore
Keyword(s):  
Experimental Data ◽  
Laser Ablation ◽  
Computer Model ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Swelling Characteristics ◽  
Vacuum Ultraviolet Laser ◽  
193 Nm ◽  
Fluence Range

ABSTRACTVacuum-ultraviolet laser ablation of Teflon is reviewed. The 157 nm irradiation of Teflon produces clean ablation sites well suited to micromachining applications in the electronics and medical fields. At 193 nm, etching profiles are poorly defined, showing swelling characteristics commonly produced by longer wavelength lasers. Comprehensive new 193 nm ablation data are presented showing the first evidence of incubation effects for Teflon. A computer model was developed to include ablation, swelling and incubation processes. The computer results satisfactorily model the experimental data over a large fluence range of 0.6 to 13 J/cm2 with three adjustable parameters.

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