Dual‐mode microwave/radio frequency plasma deposition of dielectric thin films

L. Martinu; J. E. Klemberg‐Sapieha; M. R. Wertheimer

doi:10.1063/1.101566

Dual‐mode microwave/radio frequency plasma deposition of dielectric thin films

Applied Physics Letters ◽

10.1063/1.101566 ◽

1989 ◽

Vol 54 (26) ◽

pp. 2645-2647 ◽

Cited By ~ 47

Author(s):

L. Martinu ◽

J. E. Klemberg‐Sapieha ◽

M. R. Wertheimer

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Plasma Deposition ◽

Radio Frequency Plasma ◽

Dual Mode ◽

Dielectric Thin Films ◽

Frequency Plasma ◽

Microwave Radio

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Time-resolved measurements of ion energy distributions in dual-mode pulsed-microwave/radio frequency plasma

Journal of Applied Physics ◽

10.1063/1.373714 ◽

2000 ◽

Vol 88 (2) ◽

pp. 635-642 ◽

Cited By ~ 25

Author(s):

O. Zabeida ◽

A. Hallil ◽

M. R. Wertheimer ◽

L. Martinu

Keyword(s):

Radio Frequency ◽

Radio Frequency Plasma ◽

Dual Mode ◽

Energy Distributions ◽

Time Resolved ◽

Ion Energy ◽

Frequency Plasma ◽

Microwave Radio ◽

Ion Energy Distributions ◽

Time Resolved Measurements

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On the Role of Tin Doping in InOx Thin Films Deposited by Radio Frequency-Plasma Enhanced Reactive Thermal Evaporation

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2010.1436 ◽

2010 ◽

Vol 10 (4) ◽

pp. 2713-2716 ◽

Cited By ~ 4

Author(s):

A. Amaral ◽

P. Brogueira ◽

G. Lavareda ◽

C. Nunes de Carvalho

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Thermal Evaporation ◽

Radio Frequency Plasma ◽

Frequency Plasma

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Solar-Blind Photoresistors Based on $\hbox{Mg}_{0.48} \hbox{Zn}_{0.52}\hbox{O}$ Thin Films Grown on $r\hbox{-Al}_{2} \hbox{O}_{3}$ Substrates by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy

IEEE Transactions on Electron Devices ◽

10.1109/ted.2012.2193886 ◽

2012 ◽

Vol 59 (7) ◽

pp. 1970-1973 ◽

Cited By ~ 12

Author(s):

F. J. Liu ◽

Z. F. Hu ◽

L. Zhu ◽

Z. J. Li ◽

H. Q. Huang ◽

...

Keyword(s):

Thin Films ◽

Molecular Beam Epitaxy ◽

Radio Frequency ◽

Molecular Beam ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Solar Blind

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Investigation of Ta2O5 and TaSixOy thin films obtained by radio frequency plasma assisted laser ablation for gate dielectric applications

Applied Surface Science ◽

10.1016/j.apsusc.2013.03.154 ◽

2013 ◽

Vol 276 ◽

pp. 691-696 ◽

Cited By ~ 1

Author(s):

M. Filipescu ◽

V. Ion ◽

S. Somacescu ◽

B. Mitu ◽

M. Dinescu

Keyword(s):

Thin Films ◽

Laser Ablation ◽

Radio Frequency ◽

Gate Dielectric ◽

Radio Frequency Plasma ◽

Frequency Plasma

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Synthesis and magnetic properties of Cu doped ZnO nanorods via radio frequency plasma deposition

Applied Physics Letters ◽

10.1063/1.2957037 ◽

2008 ◽

Vol 93 (2) ◽

pp. 023103 ◽

Cited By ~ 11

Author(s):

Z. F. Wu ◽

X. M. Wu ◽

L. J. Zhuge ◽

X. M. Chen ◽

X. F. Wang

Keyword(s):

Magnetic Properties ◽

Radio Frequency ◽

Plasma Deposition ◽

Zno Nanorods ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Doped Zno

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Synthesis and magnetic properties of Cr doped ZnO films via radio frequency plasma deposition

Vacuum ◽

10.1016/j.vacuum.2012.09.016 ◽

2013 ◽

Vol 90 ◽

pp. 6-9 ◽

Cited By ~ 6

Author(s):

Z.F. Wu ◽

Y.J. Cao ◽

F. Zhang

Keyword(s):

Magnetic Properties ◽

Radio Frequency ◽

Plasma Deposition ◽

Zno Films ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Doped Zno

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Molecular control of surface film compositions via pulsed radio-frequency plasma deposition of perfluoropropylene oxide

Chemistry of Materials ◽

10.1021/cm00016a005 ◽

1991 ◽

Vol 3 (4) ◽

pp. 575-577 ◽

Cited By ~ 63

Author(s):

Charles R. Savage ◽

Richard B. Timmons ◽

Jacob W. Lin

Keyword(s):

Radio Frequency ◽

Plasma Deposition ◽

Surface Film ◽

Radio Frequency Plasma ◽

Molecular Control ◽

Frequency Plasma

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Structural and optoelectronic properties of silicon germanium alloy thin films deposited by pulsed radio frequency plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.2981190 ◽

2008 ◽

Vol 104 (6) ◽

pp. 063709 ◽

Cited By ~ 5

Author(s):

A. Bhaduri ◽

P. Chaudhuri ◽

D. L. Williamson ◽

S. Vignoli ◽

P. P. Ray ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Silicon Germanium ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Germanium Alloy ◽

Structural And Optoelectronic Properties

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Mass Spectral Investigation of the Radio-Frequency Plasma Deposition of Hexamethyldisiloxane

The Journal of Physical Chemistry B ◽

10.1021/jp970663b ◽

1997 ◽

Vol 101 (18) ◽

pp. 3614-3619 ◽

Cited By ~ 72

Author(s):

M. R. Alexander ◽

F. R. Jones ◽

R. D. Short

Keyword(s):

Radio Frequency ◽

Plasma Deposition ◽

Spectral Investigation ◽

Radio Frequency Plasma ◽

Mass Spectral ◽

Frequency Plasma

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a-C:H thin films deposited by radio-frequency plasma: influence of gas composition on structure, optical properties and stress levels

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01271-3 ◽

2001 ◽

Vol 141 (2-3) ◽

pp. 286-296 ◽

Cited By ~ 80

Author(s):

E Tomasella ◽

C Meunier ◽

S Mikhailov

Keyword(s):

Thin Films ◽

Optical Properties ◽

Radio Frequency ◽

Radio Frequency Plasma ◽

Gas Composition ◽

Frequency Plasma ◽

Stress Levels

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