EFFECTS OF SPATIAL DISTRIBUTION IN OPTICAL BISTABILITY AND AT PHASE TRANSITIONS OF THE FIRST KIND

1988 ◽  
Vol 49 (C2) ◽  
pp. C2-429-C2-434 ◽  
Author(s):  
N. N. ROSANOV
Keyword(s):  
Spatial Distribution ◽  
Phase Transitions ◽  
Optical Bistability

scholarly journals Mulifractal phase transitions: the origin of self-organized criticality in earthquakes

1994 ◽  
Vol 1 (2/3) ◽  
pp. 191-197 ◽  
Author(s):  
C. Hooge ◽  
S. Lovejoy ◽  
D. Schertzer ◽  
S. Pecknold ◽  
J.-F. Malouin ◽  
...  
Keyword(s):  
Phase Transition ◽  
Spatial Distribution ◽  
Phase Transitions ◽  
Horizontal Plane ◽  
Spatial Location ◽  
Seismic Process ◽  
First Order ◽  
Self Organized ◽  
Self Organized Criticality ◽  
Model Independent

Abstract. Fractal and occasionally multifractal behaviour has been invoked to characterize (independently of their magnitude) the spatial distribution of seismic epicenters, whereas more recently, the frequency distribution of magnitudes (irrespective of their spatial location) has been considered as a manifestation of Self-Organized Criticality (SOC). In this paper we relate these two aspects on rather general grounds, (i.e. in a model independent way), and further show that this involves a non-classical SOC. We consider the multifractal characteristics of the projection of the space-time seismic process onto the horizontal plane whose values are defined by the measured ground displacements, we show that it satisfies the requirements for a first order multifractal phase transition and by implication for a non-classical SOC. We emphasize the important consequences of the stochastic alternative to the classical (deterministic) SOC.

scholarly journals Signatures of optical phase transitions in superradiant and subradiant atomic arrays

2020 ◽  
Vol 3 (1) ◽  
Author(s):  
Christopher D. Parmee ◽  
Janne Ruostekoski
Keyword(s):  
Phase Transitions ◽  
Optical Bistability ◽  
Cold Atoms ◽  
Scattered Light ◽  
Mean Field Theory ◽  
Mean Field ◽  
Excited Level ◽  
Optical Phase ◽  
Planar Arrays ◽  
Intrinsic Optical Bistability

Abstract Resonant light interacting with matter supports different phases of a polarisable medium, and optical bistability where two phases coexist. Such phases have previously been actively studied in cavities. Here, we identify signatures of optical phase transitions and optical bistability mapped onto scattered light in free-space planar arrays of cold atoms. Methods on how to explore such systems in superradiant and extreme subradiant states are proposed. The cooperativity threshold and intensity regimes for the intrinsic optical bistability, supported by resonant dipole-dipole interactions alone, are derived in several cases of interest analytically. Subradiant states require lower intensities, but stronger cooperativity for the existence of non-trivial phases than superradiant states. The transmitted light reveals phase transitions and bistability that are predicted by mean-field theory as large jumps in coherent and incoherent signals and hysteresis. In the quantum solution, traces of phase transitions are identified in enhanced quantum fluctuations of excited level populations.

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Electron Microscopy of Graphite Intercalation Compounds

1982 ◽  
Vol 40 ◽  
pp. 544-545
Author(s):  
G. Timp ◽  
L. Salamanca-Riba ◽  
L.W. Hobbs ◽  
G. Dresselhaus ◽  
M.S. Dresselhaus
Keyword(s):  
Electron Microscopy ◽  
Phase Transitions ◽  
Domain Wall ◽  
Intercalation Compounds ◽  
Lattice Plane ◽  
Wall Model ◽  
Graphite Intercalation Compounds ◽  
Fundamental Symmetry ◽  
Graphite Intercalation

Electron microscopy can be used to study structures and phase transitions occurring in graphite intercalations compounds. The fundamental symmetry in graphite intercalation compounds is the staging periodicity whereby each intercalate layer is separated by n graphite layers, n denoting the stage index. The currently accepted model for intercalation proposed by Herold and Daumas assumes that the sample contains equal amounts of intercalant between any two graphite layers and staged regions are confined to domains. Specifically, in a stage 2 compound, the Herold-Daumas domain wall model predicts a pleated lattice plane structure.

SEM evaluation of the TEM cold-stage double-film specimen

1984 ◽  
Vol 42 ◽  
pp. 272-273
Author(s):  
Jayesh Bellare
Keyword(s):  
Spatial Distribution ◽  
Sample Preparation ◽  
Sample Thickness ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Liquid Sample ◽  
Thin Specimen ◽  
Sample Preparation Technique ◽  
Cold Stage ◽  
Film Specimen

Seeing is believing, but only after the sample preparation technique has received a systematic study and a full record is made of the treatment the sample gets.For microstructured liquids and suspensions, fast-freeze thermal fixation and cold-stage microscopy is perhaps the least artifact-laden technique. In the double-film specimen preparation technique, a layer of liquid sample is trapped between 100- and 400-mesh polymer (polyimide, PI) coated grids. Blotting against filter paper drains excess liquid and provides a thin specimen, which is fast-frozen by plunging into liquid nitrogen. This frozen sandwich (Fig. 1) is mounted in a cooling holder and viewed in TEM.Though extremely promising for visualization of liquid microstructures, this double-film technique suffers from a) ireproducibility and nonuniformity of sample thickness, b) low yield of imageable grid squares and c) nonuniform spatial distribution of particulates, which results in fewer being imaged.

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