LOW-TEMPERATURE GROWTH CONDITIONS AND PROPERTIES OF AlGa (As) Sb ON GaSb SUBSTRATE BY LPE

1982 ◽  
Vol 43 (C5) ◽  
pp. C5-29-C5-38
Author(s):  
S. Fujita ◽  
N. Hamaguchi ◽  
Y. Takeda ◽  
A. Sasaki
Keyword(s):  
Low Temperature ◽  
Growth Conditions ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Gasb Substrate

Low-temperature growth conditions of YBa2Cu3O7−δ using Ba–Cu–Ag–O–F solvent

2002 ◽  
Vol 236 (1-3) ◽  
pp. 221-224 ◽  
Author(s):  
Yasuji Yamada ◽  
Toshihiro Suga ◽  
Izumi Hirabayashi
Keyword(s):  
Low Temperature ◽  
Growth Conditions ◽  
Temperature Growth ◽  
Low Temperature Growth

scholarly journals Plasma-Enhanced Chemical Vapor Deposition of Acetylene on Codeposited Bimetal Catalysts Increasing Graphene Sheet Continuity Under Low-Temperature Growth Conditions

2019 ◽  
Vol 14 (1) ◽  
Author(s):  
Joshua Tracy ◽  
Otto Zietz ◽  
Samuel Olson ◽  
Jun Jiao
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Inductively Coupled Plasma ◽  
Chemical Vapor ◽  
Growth Conditions ◽  
Monolayer Graphene ◽  
Au Catalyst ◽  
Temperature Growth ◽  
Low Temperature Growth

Abstract Here, we report a novel method for low-temperature synthesis of monolayer graphene at 450 °C on a polycrystalline bimetal Ni-Au catalyst. In this study, low-temperature chemical vapor deposition synthesis of graphene was performed at 450 °C on codeposited Ni-Au which shows successful monolayer graphene formation without an extra annealing process. The experimental results suggest that electron beam codeposition of bimetal catalyst is the key procedure that enables the elimination of the pre-growth high-temperature annealing of the catalyst prior to graphene synthesis, an indispensable process, used in previous reports. The formation was further improved by plasma-assisted growth in which the inductively coupled plasma ionizes the carbon precursors that interact with codeposited Ni-Au catalyst of 50 nm in thickness at 450 °C. These combined growth conditions drastically increase the graphene’s sheet uniformity and area connectivity from 11.6% to 99%. These fabrication parameters enable the graphene formation that shifts from a bulk diffusion-based growth model towards a surface based reaction. The technique reported here opens the opportunity for the low-temperature growth of graphene for potential use in future CMOS applications.

A novel low-temperature growth of uniform CuInS2 thin films and their application in selenization/sulfurization-free CuInS2 solar cells

2021 ◽  
Vol 26 ◽  
pp. 102050
Author(s):  
Mehdi Dehghani ◽  
Ershad Parvazian ◽  
Nastaran Alamgir Tehrani ◽  
Nima Taghavinia ◽  
Mahmoud Samadpour
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Low Temperature ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Cuins2 Thin Films

scholarly journals Practical Route for the Low-Temperature Growth of Large-Area Bilayer Graphene on Polycrystalline Nickel by Cold-Wall Chemical Vapor Deposition

ACS Omega ◽  
2021 ◽  
Author(s):  
Muhammad Aniq Shazni Mohammad Haniff ◽  
Nur Hamizah Zainal Ariffin ◽  
Poh Choon Ooi ◽  
Mohd Farhanulhakim Mohd Razip Wee ◽  
Mohd Ambri Mohamed ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Bilayer Graphene ◽  
Cold Wall ◽  
Polycrystalline Nickel ◽  
Large Area ◽  
Temperature Growth ◽  
Low Temperature Growth

Low-Temperature Growth of Ferroelectric Hf0.5Zr0.5O2 Thin Films Assisted by Deep Ultraviolet Light Irradiation

2021 ◽  
Vol 3 (3) ◽  
pp. 1244-1251
Author(s):  
Hyunjin Joh ◽  
Gopinathan Anoop ◽  
Won-June Lee ◽  
Dipjyoti Das ◽  
Jun Young Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Ultraviolet Light ◽  
Light Irradiation ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Ultraviolet Light Irradiation ◽  
Deep Ultraviolet

The influence of preinfection cold hardening and disease development period on the interaction between barley yellow dwarf virus and cold stress tolerance in wheat

1983 ◽  
Vol 61 (7) ◽  
pp. 1935-1940 ◽  
Author(s):  
C. J. Andrews ◽  
Y. C. Paliwal
Keyword(s):  
Low Temperature ◽  
Barley Yellow Dwarf Virus ◽  
Yellow Dwarf ◽  
Dwarf Virus ◽  
Dry Matter Content ◽  
Disease Development ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Barley Yellow Dwarf ◽  
Yellow Dwarf Virus

Cold hardness and ice encasement tolerance of 'Fredrick' and 'Norstar' winter wheats as affected by infection with barley yellow dwarf virus (BYDV) were determined during inoculation, disease development periods, and low-temperature growth. Plants were either prehardened to cold, or warm grown before infection; two disease development periods (DDP) were utilized. A long DDP induced greater pathogenesis and greater hardiness reduction than a short DDP. The effect of virus infection on the final level of hardiness of prehardened plants was generally greater than on that of nonprehardened plants. Viral infection reduced hardiness up to 3.5 °C in 'Fredrick' wheat, but reductions of 6–10 °C below hardiness potential were recorded after certain environmental regimes allowing disease development. Ice tolerance was reduced by BYDV infection in early low-temperature growth but was increased by infection after 4 months at low temperature. This increase in survival was associated with higher dry matter content in infected than in noninfected plants.

scholarly journals Low temperature growth of FePt and CoPt films on MgO(111) substrate

2011 ◽  
Vol 109 (7) ◽  
pp. 07B743 ◽  
Author(s):  
Fu-Te Yuan ◽  
A. C. Sun ◽  
Jui-Kuo Mei ◽  
W. M. Liao ◽  
Jen-Hwa Hsu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Temperature Growth ◽  
Low Temperature Growth
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