LUMINESCENCE DE CuCl EXCITÉE PAR UNE SOURCE INTENSE (LASER)

1966 ◽  
Vol 27 (C2) ◽  
pp. C2-100-C2-103 ◽  
Author(s):  
J.-B. GRUN ◽  
A. MYSYROWICZ ◽  
S. NIKITINE
Keyword(s):  
Intense Laser

Atoms in Intense Laser Fields

2009 ◽  
Author(s):  
C. J. Joachain ◽  
N. J. Kylstra ◽  
R. M. Potvliege
Keyword(s):  
Intense Laser ◽  
Intense Laser Fields ◽  
Laser Fields

Laser-matter interaction in intense laser fields

1993 ◽  
Vol 90 ◽  
pp. 1275-1282 ◽  
Author(s):  
LA Lompré ◽  
P Monot ◽  
T Auguste ◽  
G Mainfray ◽  
C Manus
Keyword(s):  
Intense Laser ◽  
Intense Laser Fields ◽  
Laser Fields ◽  
Matter Interaction

Control of proton beam divergence in intense-laser foil-plasma interaction

2006 ◽  
Vol 133 ◽  
pp. 549-551 ◽  
Author(s):  
S. Kawata ◽  
R. Sonobe ◽  
S. Miyazaki ◽  
K. Sakai ◽  
T. Kikuchi
Keyword(s):  
Proton Beam ◽  
Beam Divergence ◽  
Intense Laser ◽  
Plasma Interaction

Dynamics of overdense plasma interacting with ultrashort intense laser and consideration on neutron yield

2006 ◽  
Vol 133 ◽  
pp. 515-519
Author(s):  
Y. Rhee ◽  
S. M. Nam ◽  
J. M. Han ◽  
Y. H. Cha ◽  
D. H. Kwon ◽  
...  
Keyword(s):  
Neutron Yield ◽  
Intense Laser ◽  
Overdense Plasma

Intense Laser-Matter Interactions. An Approach to Laser Driven Electronic and Nuclear Energy Transfer

1988 ◽  
Author(s):  
Francis X. Hartmann ◽  
Karen K. Garcia ◽  
Donald W. Noid ◽  
Michael L. Koszykowski ◽  
John K. Munro ◽  
...  
Keyword(s):  
Energy Transfer ◽  
Nuclear Energy ◽  
Intense Laser

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals Precise description of single and double ionization of hydrogen molecule in intense laser pulses

2012 ◽  
Vol 137 (4) ◽  
pp. 044112 ◽  
Author(s):  
Mohsen Vafaee ◽  
Firoozeh Sami ◽  
Babak Shokri ◽  
Behnaz Buzari ◽  
Hassan Sabzyan
Keyword(s):  
Hydrogen Molecule ◽  
Laser Pulses ◽  
Double Ionization ◽  
Intense Laser ◽  
Precise Description ◽  
Intense Laser Pulses

scholarly journals Concept of generation of extremely compressed high-energy electron bunches in several interfering intense laser pulses with tilted amplitude fronts

2012 ◽  
Vol 31 (1) ◽  
pp. 23-28 ◽  
Author(s):  
V.V. Korobkin ◽  
M.Yu. Romanovskiy ◽  
V.A. Trofimov ◽  
O.B. Shiryaev
Keyword(s):  
Laser Pulses ◽  
High Energy ◽  
Intense Laser ◽  
High Energy Electron ◽  
Speed Of Light ◽  
Electron Bunches ◽  
Newton Equation ◽  
High Energies ◽  
Neutral Gas ◽  
Intense Laser Pulses

AbstractA new concept of generating tight bunches of electrons accelerated to high energies is proposed. The electrons are born via ionization of a low-density neutral gas by laser radiation, and the concept is based on the electrons acceleration in traps arising within the pattern of interference of several relativistically intense laser pulses with amplitude fronts tilted relative to their phase fronts. The traps move with the speed of light and (1) collect electrons; (2) compress them to extremely high density in all dimensions, forming electron bunches; and (3) accelerate the resulting bunches to energies of at least several GeV per electron. The simulations of bunch formation employ the Newton equation with the corresponding Lorentz force.

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