scholarly journals High-Tc SQUIDs on Silicon Substrates

1996 ◽  
Vol 06 (C3) ◽  
pp. C3-361-C3-365 ◽  
Author(s):  
P. Seidel ◽  
S. Linzen ◽  
F. Schmidl ◽  
R. Cihar
Keyword(s):  
1998 ◽  
Vol 08 (PR3) ◽  
pp. Pr3-297-Pr3-300 ◽  
Author(s):  
S. Linzen ◽  
Y. J. Tian ◽  
U. Hübner ◽  
F. Schmidl ◽  
J. Scherbel ◽  
...  

1989 ◽  
pp. 303-310
Author(s):  
D. DUBREUIL ◽  
G. GARRY ◽  
Y. LEMAÎTRE ◽  
L. ROGIER ◽  
D. DIEUMEGARD

1989 ◽  
Vol 151 ◽  
pp. 303-310 ◽  
Author(s):  
D Dubreuil ◽  
G Garry ◽  
Y Lemaître ◽  
L Rogier ◽  
D Dieumegard

1993 ◽  
Vol 1 (3-6) ◽  
pp. 853-857
Author(s):  
Lelia Ciontea ◽  
Traian Petrisor ◽  
Alin Giurgiu

ChemInform ◽  
1988 ◽  
Vol 19 (28) ◽  
Author(s):  
G. POULLAIN ◽  
B. MERCEY ◽  
H. MURRAY ◽  
B. RAVEAU

1995 ◽  
Vol 67 (15) ◽  
pp. 2235-2237 ◽  
Author(s):  
S. Linzen ◽  
F. Schmidl ◽  
L. Dörrer ◽  
P. Seidel

1988 ◽  
Vol 02 (01) ◽  
pp. 523-526 ◽  
Author(s):  
G. POULLAIN ◽  
B. MERCEY ◽  
H. MURRAY ◽  
B. RAVEAU

YBa2Cu3O7 films have been deposited by pulse laser evaporation on silicon substrates with metal nitrides (AIN, Si 3 N 4, GaN) buffer layers. The film superconductivity is restored after annealing at 900°C in pure oxygen atmosphere. X-ray diffraction patterns confirm the presence of the orthorhombic phase and resistivity measurements versus temperature shows a resistive transition with an onset at 90 K and a complete zero resistance at 70 K.


1988 ◽  
Vol 02 (05) ◽  
pp. 753-753
Author(s):  
G. POULLAIN ◽  
B. MERCEY ◽  
H. MURRAY ◽  
B. RAVEAU
Keyword(s):  

Author(s):  
R. W. Ditchfield ◽  
A. G. Cullis

An energy analyzing transmission electron microscope of the Möllenstedt type was used to measure the electron energy loss spectra given by various layer structures to a spatial resolution of 100Å. The technique is an important, method of microanalysis and has been used to identify secondary phases in alloys and impurity particles incorporated into epitaxial Si films.Layers Formed by the Epitaxial Growth of Ge on Si Substrates Following studies of the epitaxial growth of Ge on (111) Si substrates by vacuum evaporation, it was important to investigate the possible mixing of these two elements in the grown layers. These layers consisted of separate growth centres which were often triangular and oriented in the same sense, as shown in Fig. 1.


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