scholarly journals Optical absorption studies of ion implanted and amorphous silicon

1994 ◽  
Vol 04 (C7) ◽  
pp. C7-113-C7-120
Author(s):  
U. Zammit ◽  
K. N. Madhusoodanan ◽  
M. Marinelli ◽  
F. Scudieri ◽  
R. Pizzoferrato ◽  
...  
1988 ◽  
Vol 163 ◽  
pp. 331-335 ◽  
Author(s):  
K.L. Bhatia ◽  
W. Krätschmer ◽  
S. Kalbitzer

1970 ◽  
Vol 16 (5) ◽  
pp. 205-208 ◽  
Author(s):  
B. L. Crowder ◽  
R. S. Title ◽  
M. H. Brodsky ◽  
G. D. Pettit

1981 ◽  
Vol 42 (C4) ◽  
pp. C4-779-C4-782 ◽  
Author(s):  
F. J. Demond ◽  
G. Müller ◽  
H. Damjantschitsch ◽  
H. Mannsperger ◽  
S. Kalbitzer ◽  
...  

2020 ◽  
Vol 2 (3) ◽  
Author(s):  
Lukas Terkowski ◽  
Iain W. Martin ◽  
Daniel Axmann ◽  
Malte Behrendsen ◽  
Felix Pein ◽  
...  

1998 ◽  
Vol 540 ◽  
Author(s):  
J. M. Gibson ◽  
J-Y. Cheng ◽  
P. Voyles ◽  
M.M.J. TREACY ◽  
D.C. Jacobson

AbstractUsing fluctuation microscopy, we show that ion-implanted amorphous silicon has more medium-range order than is expected from the continuous random network model. From our previous work on evaporated and sputtered amorphous silicon, we conclude that the structure is paracrystalline, i.e. it possesses crystalline-like order which decays with distance from any point. The observation might pose an explanation for the large heat of relaxation that is evolved by ion-implanted amorphous semiconductors.


1985 ◽  
Vol 10 (1-2) ◽  
pp. 93-96
Author(s):  
S.B.S. Sastry ◽  
S. Nagarajan ◽  
G. Muralidharan

2002 ◽  
Vol 100 (1) ◽  
pp. 471-474 ◽  
Author(s):  
G. M. Ferraz ◽  
S. Watanabe ◽  
S. O. Souza ◽  
R. M. F. Scalvi

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