A Simple Ion Flux Estimation in a Low Pressure R.F. Plasma (13.56 MHz)

1997 ◽  
Vol 7 (4) ◽  
pp. 937-950
Author(s):  
I. Grenier ◽  
V. Massereau ◽  
A. Celerier ◽  
J. Machet
Harmful Algae ◽  
2018 ◽  
Vol 80 ◽  
pp. 55-63 ◽  
Author(s):  
Jorge I. Mardones ◽  
Lana Shabala ◽  
Sergey Shabala ◽  
Juan José Dorantes-Aranda ◽  
Andreas Seger ◽  
...  

2002 ◽  
Vol 74 (3) ◽  
pp. 401-405
Author(s):  
Christine Charles

Good-quality silicon dioxide films have been deposited at low temperature (200 °C) using continuous and pulsed oxygen/silane plasmas coupled in a high-density, low-pressure helicon reactor. Although the total ion flux determines many of the structural properties of the deposited oxide, we have found that silicon-containing ions contribute to the film growth (up to 50 %) and appear to be responsible for the measured compressive stress.


1999 ◽  
Vol 8 (3) ◽  
pp. 457-462 ◽  
Author(s):  
T E Sheridan ◽  
P Chabert ◽  
R W Boswell
Keyword(s):  
Ion Flux ◽  

2002 ◽  
Vol 74 (3) ◽  
pp. 397-400 ◽  
Author(s):  
Jean-Paul Booth

Radio-frequency excited, low-pressure plasmas in halogen-containing gases are widely used to etch submicronic features in a range of materials during integrated circuit manufacture. Costly process-drift problems are often caused by the ubiquitous deposition of polymer layers on the reactor walls. Simple and robust sensors of the reactor performance are needed to monitor and manage these effects. This paper presents results obtained in industrial plasma-etching machines using a deposition-tolerant ion flux probe and broadband UV­vis absorption spectroscopy.


Author(s):  
L.H. Bolz ◽  
D.H. Reneker

The attack, on the surface of a polymer, by the atomic, molecular and ionic species that are created in a low pressure electrical discharge in a gas is interesting because: 1) significant interior morphological features may be revealed, 2) dielectric breakdown of polymeric insulation on high voltage power distribution lines involves the attack on the polymer of such species created in a corona discharge, 3) adhesive bonds formed between polymer surfaces subjected to such SDecies are much stronger than bonds between untreated surfaces, 4) the chemical modification of the surface creates a reactive surface to which a thin layer of another polymer may be bonded by glow discharge polymerization.


Author(s):  
Gert Ehrlich

The field ion microscope, devised by Erwin Muller in the 1950's, was the first instrument to depict the structure of surfaces in atomic detail. An FIM image of a (111) plane of tungsten (Fig.l) is typical of what can be done by this microscope: for this small plane, every atom, at a separation of 4.48Å from its neighbors in the plane, is revealed. The image of the plane is highly enlarged, as it is projected on a phosphor screen with a radius of curvature more than a million times that of the sample. Müller achieved the resolution necessary to reveal individual atoms by imaging with ions, accommodated to the object at a low temperature. The ions are created at the sample surface by ionization of an inert image gas (usually helium), present at a low pressure (< 1 mTorr). at fields on the order of 4V/Å.


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