Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputtering

2004 ◽  
Vol 29 (1) ◽  
pp. 33-38 ◽  
Author(s):  
A. Ben Othman ◽  
Y. Leconte ◽  
P. Marie ◽  
K. Zellama ◽  
C. Goncalves ◽  
...  
Author(s):  
Wuttichai Phae-ngam ◽  
Tossaporn Lertvanithphol ◽  
Chanunthorn Chananonnawathorn ◽  
Rattanachai Kowong ◽  
Mati Horprathum ◽  
...  

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