Characteristics of plasma formation in a hollow cathode triggered fast capillary discharge

2000 ◽  
Author(s):  
I. Krisch
Keyword(s):  
Hollow Cathode ◽  
Capillary Discharge ◽  
Plasma Formation

Experimental studies on a pulsed hollow cathode capillary discharge

1997 ◽  
Author(s):  
P. Choi ◽  
M. Favre ◽  
C. Dumitrescu-Zoita ◽  
J. Moreno ◽  
H. Chuaqui ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Experimental Studies ◽  
Capillary Discharge

Deposition of a multi-layer coating in a gas-metal beam-plasma formation at low pressure

2021 ◽  
Vol 64 (1) ◽  
pp. 125-129
Author(s):  
V.V. Denisov ◽  
◽  
Yu.A. Denisova ◽  
E.L. Vardanyan ◽  
E.V. Ostroverkhov ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Hollow Cathode ◽  
Multilayer Coating ◽  
Low Pressure ◽  
Plasma Formation ◽  
Vacuum Arc ◽  
Arc Spraying ◽  
Arc Plasma ◽  
Functional Coatings ◽  
Beam Plasma

The vacuum-arc plasma-assisted method was used to deposit a multilayer coating based on Ti and Al in two discharge systems - in a traditional plasma-assisted vacuum-arc spraying system and in a system for generating of gas-metal beam-plasma formation formed in a hollow cathode of a non-self-sustained low pressure glow discharge. The coatings obtained in the investigated discharge schemes are close in elemental and phase composition. In the coating deposited in the plasma-beam formation, the aluminum content is 8% lower, which is probably due to the overall higher average value of the ion flux density on the surface of the growing film in a non-self-sustained glow discharge. In the coating obtained by sputtering in a beam-plasma formation, there are no elements that are part of the material of the sputtered hollow cathode. Gas-metal beam-plasma formations, formed at low pressure, are promising in the processes of functional coatings deposition by the vacuum-arc plasma-assisted method.

Characteristics of Capillary Discharge Lamp Developed for Determination of S, P, Se, and as by Flame Atomic Absorption Spectroscopy

1985 ◽  
Vol 39 (3) ◽  
pp. 519-526 ◽  
Author(s):  
M. D. Lowe ◽  
M. M. Sutton
Keyword(s):  
Atomic Absorption ◽  
Absorption Spectroscopy ◽  
Hollow Cathode ◽  
Atomic Absorption Spectroscopy ◽  
Detection Limits ◽  
Capillary Discharge ◽  
Operating Conditions ◽  
Flame Atomic Absorption Spectroscopy ◽  
Discharge Lamp ◽  
Flame Atomic Absorption

The characteristics of a capillary discharge lamp, developed as a spectral source for the measurement of sulphur, phosphorus, selenium, and arsenic concentrations by flame atomic absorption spectroscopy, have been determined. Atomic spectral lines for each of the elements were produced when flowing mixtures of helium and vapor of the element, or a compound of the element, were passed through a quartz capillary discharge tube. Absorbance-concentration relationships, together with analytical sensitivities and detection limits, were obtained for sulphur, phosphorus, selenium, and arsenic with the use of a modified flame atomic absorption spectrophotometer, the optical system of which was purged with argon when necessary. The capillary discharge lamp readings were compared with measurements made under similar operating conditions with selenium and arsenic hollow cathode lamps. The capillary discharge lamp results were also compared with those obtained by other workers using electrodeless discharge lamps, modified hollow cathode lamps, and controlled temperature-gradient lamps. It was evident that the capillary discharge lamp possesses performance characteristics which make it potentially suitable as a spectral source for atomic absorption spectroscopy. Sensitivities and detection limits obtained with the use of this novel lamp were similar to those reported for other spectral sources.

Plasma formation using a capillary discharge in water for biotechnological applications

2012 ◽  
Vol 60 (6) ◽  
pp. 921-924 ◽  
Author(s):  
Ye-Jin Kim ◽  
Yong-Cheol Hong ◽  
Sang-Ju Lee ◽  
Bong-Ju Lee
Keyword(s):  
Capillary Discharge ◽  
Plasma Formation ◽  
Biotechnological Applications

Time Resolved Studies of a Pulsed Hollow Cathode Capillary Discharge

1998 ◽  
pp. 479-484
Author(s):  
P. Choi ◽  
C. Dumitrescu-Zoita ◽  
M. Favre ◽  
J. Moreno ◽  
H. Chuaqui ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Capillary Discharge ◽  
Time Resolved

Effect of Operating Pressure on Plasma Formation in the Transient Hollow Cathode Discharge

1994 ◽  
Author(s):  
C. S. Wong ◽  
C. X. Ong ◽  
S. P. Moo ◽  
P. Choi ◽  
Malcolm Haines ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Plasma Formation ◽  
Hollow Cathode Discharge ◽  
Operating Pressure

MHD simulation of a fast hollow cathode capillary discharge

2001 ◽  
Vol 43 (4) ◽  
pp. 571-588 ◽  
Author(s):  
Andrey Esaulov ◽  
Pavel Sasorov ◽  
Leopoldo Soto ◽  
Marcelo Zambra ◽  
Jun-ichi Sakai
Keyword(s):  
Hollow Cathode ◽  
Capillary Discharge ◽  
Mhd Simulation
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