High-speed thin-film transistor on flexible substrate fabricated at room temperature

2006 ◽  
Vol 42 (23) ◽  
pp. 1365 ◽  
Author(s):  
J. Vaillancourt ◽  
X. Lu ◽  
X. Han ◽  
D.C. Janzen
Keyword(s):  
Thin Film ◽  
High Speed ◽  
Room Temperature ◽  
Flexible Substrate ◽  
Thin Film Transistor

Printable high-speed thin-film transistor on flexible substrate using carbon nanotube solution

2007 ◽  
Vol 2 (4) ◽  
pp. 96 ◽  
Author(s):  
X. Han ◽  
D.C. Janzen ◽  
J. Vaillancourt ◽  
X. Lu
Keyword(s):  
Thin Film ◽  
Carbon Nanotube ◽  
High Speed ◽  
Flexible Substrate ◽  
Thin Film Transistor

Effects of Drying Temperature on Surface Morphology and Electric Behavior of IGZO Thin Film Prepared by Solution Process

2015 ◽  
Vol 1731 ◽  
Author(s):  
Nobuko Fukuda ◽  
Shintaro Ogura ◽  
Koji Abe ◽  
Hirobumi Ushijima
Keyword(s):  
Thin Film ◽  
Organic Solvents ◽  
Room Temperature ◽  
Thin Film Transistor ◽  
Solution Process ◽  
Precursor Solution ◽  
Drying Process ◽  
Minor Variation ◽  
Drying Temperature ◽  
Metal Nitrates

ABSTRACTWe have achieved a drastic improvement of the performance as thin film transistor (TFT) for solution-processed IGZO thin film by controlling drying temperature of solvents containing the precursor solution. The IGZO-precursor solution was prepared by mixing of metal nitrates and two kinds of organic solvents, 2-methoxyethanol (2ME) and 2,2,2-trifluoroethanol (TFE). 2ME was used for dissolving metal nitrates. TFE was added as a solvent for reducing surface tension as small as possible, leading to improvement of the wettability of the precursor solution on the surface of the substrate. In order to discuss the relationship between morphology and drying process, the spin-coated IGZO-precursor films were dried at room temperature and 140 °C on a hotplate, respectively. Annealing of the both films was carried out at 300 °C in an electric oven for 60 min after each drying process. Drying at room temperature provides a discontinuous film, resulting in a large variation of the TFT performance. On the other hand, drying at 140 °C provides a continuous film, resulting in the higher TFT performance and a minor variation. The difference in surface morphologies would be derived from the evaporation rate of the organic solvents. The rapid evaporation at 140 °C brings about rapid pinning of the spin-coated precursor layer on the substrate. Preparation process via the drying at 140 °C gave ∼ 1 cm2 V-1 s-1 of the saturated mobility, quite small hysteresis, and 107∼ 108 of the on-off ratio.

Formaldehyde Detection Based on P3HT/InSnO Composite Thin Film Transistor

2014 ◽  
Vol 875-877 ◽  
pp. 82-86
Author(s):  
Xian Li ◽  
Ya Dong Jiang ◽  
Hui Ling Tai ◽  
Guang Zhong Xie ◽  
Wen Chao Dan
Keyword(s):  
Thin Film ◽  
Composite Film ◽  
Thin Film Transistors ◽  
Room Temperature ◽  
Thin Film Transistor ◽  
Organic Thin Film Transistors ◽  
Composite Thin Film ◽  
Organic Thin Film ◽  
Response And Recovery

Formaldehyde, a colorless and pungent-smelling gas, had been confirmed be a huge threat to people health. The detection of formaldehyde was necessary and important at room temperature. Sprayed P3HT/InSnO composite film based on organic thin film transistors (OTFT) was fabricated to detect formaldehyde at room temperature in this paper. The results showed that P3HT/ InSnO-OTFT showed better response and recovery to HCHO compared with P3HT-OTFT at room temperature.

High performance thin film transistor with HfSiO x dielectric fabricated at room temperature RF-magnetron sputtering

2013 ◽  
Vol 9 (4) ◽  
pp. 381-384 ◽  
Author(s):  
Dongkyu Cho ◽  
Sanghyun Woo ◽  
Jungil Yang ◽  
Donghee Lee ◽  
Yoosung Lim ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Performance ◽  
Room Temperature ◽  
Thin Film Transistor ◽  
Rf Magnetron Sputtering
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