Room-temperature operation of AlGaAs/GaAs resonant tunnelling structures grown by metalorganic vapour-phase epitaxy

1989 ◽  
Vol 25 (13) ◽  
pp. 830 ◽  
Author(s):  
R.D. Schnell ◽  
H. Tews ◽  
R. Neumann
Keyword(s):  
Room Temperature ◽  
Vapour Phase ◽  
Vapour Phase Epitaxy ◽  
Resonant Tunnelling ◽  
Metalorganic Vapour Phase Epitaxy ◽  
Room Temperature Operation

Thin layers of GaInP, GaP and GaAsP in metalorganic vapour phase epitaxy-grown resonant tunnelling diodes

2002 ◽  
Vol 190 (1-4) ◽  
pp. 252-257 ◽  
Author(s):  
L.-E. Wernersson ◽  
B. Gustafson ◽  
A. Gustafsson ◽  
M. Borgström ◽  
I. Pietzonka ◽  
...  
Keyword(s):  
Vapour Phase ◽  
Thin Layers ◽  
Vapour Phase Epitaxy ◽  
Resonant Tunnelling ◽  
Metalorganic Vapour Phase Epitaxy

Growth of Uncracked Al0.80Ga0.20N/GaN DBR on Si(111)

2004 ◽  
Vol 831 ◽  
Author(s):  
M. B. Charles ◽  
M. J. Kappers ◽  
C. J. Humphreys
Keyword(s):  
Room Temperature ◽  
Crack Formation ◽  
Compressive Strain ◽  
Vapour Phase ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors ◽  
X Ray Diffraction ◽  
Vapour Phase Epitaxy ◽  
X Ray ◽  
Metalorganic Vapour Phase Epitaxy

ABSTRACTThe strain in Al0.80Ga0.20N/GaN distributed Bragg reflectors (DBRs) grown by metalorganic vapour phase epitaxy (MOVPE) on Si(111) was studied using high resolution X-ray diffraction (XRD). Previous studies have shown that a 50nm Al0.80Ga0.20N layer induced a compressive strain in Al0.12Ga0.88N capping layers and prevented crack formation. A seven period Al0.80Ga0.20N/GaN DBR was grown, but this was found to be cracked at room temperature, despite compression in the GaN layers. This problem was solved by growing an identical structure with the addition of a 650nm GaN cap, and due to the compression in this layer, the structure was crack-free.

Characterization of GaAs/AlGaAs quantum wells and quantum wires by chemical lattice imaging

1994 ◽  
Vol 52 ◽  
pp. 736-737
Author(s):  
A. Carlsson ◽  
J.-O. Malm ◽  
A. Gustafsson
Keyword(s):  
Quantum Well ◽  
Quantum Wells ◽  
Quantum Wires ◽  
Vapour Phase ◽  
Quantitative Information ◽  
Lattice Imaging ◽  
Vapour Phase Epitaxy ◽  
Metalorganic Vapour Phase Epitaxy ◽  
High Resolution Images

In this study a quantum well/quantum wire (QW/QWR) structure grown on a grating of V-grooves has been characterized by a technique related to chemical lattice imaging. This technique makes it possible to extract quantitative information from high resolution images.The QW/QWR structure was grown on a GaAs substrate patterned with a grating of V-grooves. The growth rate was approximately three monolayers per second without growth interruption at the interfaces. On this substrate a barrier of nominally Al0.35 Ga0.65 As was deposited to a thickness of approximately 300 nm using metalorganic vapour phase epitaxy . On top of the Al0.35Ga0.65As barrier a 3.5 nm GaAs quantum well was deposited and to conclude the structure an additional approximate 300 nm Al0.35Ga0.65 As was deposited. The GaAs QW deposited in this manner turns out to be significantly thicker at the bottom of the grooves giving a QWR running along the grooves. During the growth of the barriers an approximately 30 nm wide Ga-rich region is formed at the bottom of the grooves giving a Ga-rich stripe extending from the bottom of each groove to the surface.

scholarly journals Towards practical applications of quantum emitters in boron nitride

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
M. Koperski ◽  
K. Pakuła ◽  
K. Nogajewski ◽  
A. K. Dąbrowska ◽  
M. Tokarczyk ◽  
...  
Keyword(s):  
Optical Properties ◽  
Boron Nitride ◽  
Vapour Phase ◽  
Emission Characteristics ◽  
Vapour Phase Epitaxy ◽  
Practical Applications ◽  
Metalorganic Vapour Phase Epitaxy ◽  
Polydimethylsiloxane Films ◽  
Background Luminescence ◽  
Quantum Emitters

AbstractWe demonstrate quantum emission capabilities from boron nitride structures which are relevant for practical applications and can be seamlessly integrated into a variety of heterostructures and devices. First, the optical properties of polycrystalline BN films grown by metalorganic vapour-phase epitaxy are inspected. We observe that these specimens display an antibunching in the second-order correlation functions, if the broadband background luminescence is properly controlled. Furthermore, the feasibility to use flexible and transparent substrates to support hBN crystals that host quantum emitters is explored. We characterise hBN powders deposited onto polydimethylsiloxane films, which display quantum emission characteristics in ambient environmental conditions.

Group III hydride precursors for the metalorganic vapour phase epitaxy (MOVPE) of (AlGa)As/GaAs heterostructures

1991 ◽  
Vol 115 (1-4) ◽  
pp. 248-253 ◽  
Author(s):  
H. Protzmann ◽  
T. Marschner ◽  
O. Zsebök ◽  
W. Stolz ◽  
E.O. Göbel ◽  
...  
Keyword(s):  
Vapour Phase ◽  
Vapour Phase Epitaxy ◽  
Group Iii ◽  
Metalorganic Vapour Phase Epitaxy

Pulsed epitaxial lateral overgrowth of GaN by metalorganic vapour phase epitaxy

2007 ◽  
Vol 300 (1) ◽  
pp. 104-109 ◽  
Author(s):  
C. Liu ◽  
P.A. Shields ◽  
S. Denchitcharoen ◽  
S. Stepanov ◽  
A. Gott ◽  
...  
Keyword(s):  
Vapour Phase ◽  
Epitaxial Lateral Overgrowth ◽  
Vapour Phase Epitaxy ◽  
Lateral Overgrowth ◽  
Metalorganic Vapour Phase Epitaxy
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