An electron spin resonance study of the free radicals induced in O-methylisouronium chloride by X-irradiation at 77°K

1968 ◽  
Vol 0 (0) ◽  
pp. 485-488
Author(s):  
D. G. Cadena ◽  
J. R. Rowlands
Keyword(s):  
Free Radicals ◽  
Electron Spin Resonance ◽  
Electron Spin ◽  
Electron Spin Resonance Study ◽  
Spin Resonance ◽  
X Irradiation ◽  
Spin Resonance Study

An electron spin resonance study of ultraviolet photolyzed methanol adsorbed on porous high-silica glass

1969 ◽  
Vol 47 (8) ◽  
pp. 1375-1379 ◽  
Author(s):  
Michie Shimizu ◽  
H. D. Gesser ◽  
M. Fujimoto
Keyword(s):  
Free Radicals ◽  
Electron Spin Resonance ◽  
Electron Spin ◽  
Silica Glass ◽  
Electron Spin Resonance Study ◽  
Surface Contaminants ◽  
Spin Resonance ◽  
High Silica ◽  
Glass Surfaces ◽  
Spin Resonance Study

The electron spin resonance (e.s.r.) spectra of •CH3, •CHO, H and/or D, and possibly •CH2OH or •CH2OD were found by the ultraviolet (u.v.) photolysis of methanol —OH or —OD on porous high-silica glass at 77 °K. These e.s.r. spectra resemble the results of the u.v. photolysis of X-irradiated methanol indicating that some perturbation and/or sensitization occurred in the molecules by the glass surface. The absence of e.s.r. spectra from the same systems on the acid-leached glass, on the totally fluorinated glass, or on the totally —OH covered glass suggests that (i) the co-existence of surface contaminants, such as Al and Zr and not B, and some of surface —OH could be responsible for producing these free radicals, and (ii) the methanols adsorbed on these glass surfaces are stabilized against u.v. photolysis.

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