Surface structure change of a [Pt4(µ-CH3COO)8]/SiO2catalyst active for the decomposition of formic acid

1995 ◽  
Vol 91 (22) ◽  
pp. 4161-4170 ◽  
Author(s):  
Wang-Jae Chun ◽  
Keiichi Tomishige ◽  
Mamiko Hamakado ◽  
Yasuhiro Iwasawa ◽  
Kiyotaka Asakura
1983 ◽  
Vol 62 (3) ◽  
pp. 532-538 ◽  
Author(s):  
V.V. Podolinsky ◽  
V.G. Drykin

2007 ◽  
Vol 111 (51) ◽  
pp. 19126-19133 ◽  
Author(s):  
In-Su Park ◽  
Kug-Seung Lee ◽  
Jong-Ho Choi ◽  
Hee-Young Park ◽  
Yung-Eun Sung

2004 ◽  
Vol 18 (03) ◽  
pp. 289-316 ◽  
Author(s):  
Y. SHIGETA ◽  
Y. FUKAYA

In order to investigate surface structure change due to phase transition, surface melting, surface segregation and thin film growth, we have developed a new system for reflection high-energy electron diffraction (RHEED) with two pairs of magnetic coils to measure rocking curves in short time. This system is the most suitable tool to determine the structure change with temperature in a wide range, and we studied the dynamical structure change during film growth of Si on Si (111) and the phase transitions of Si (111) and Si (100) surfaces at high temperature.


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