Resistance relaxation studies of gas/metal reactions leading to simultaneous dissolution and gasification. The dissociated oxygen/tantalum system above 2000 K. Part 2.—Mechanism, kinetics and energetics of chemisorption, interface crossing and product desorption
1976 ◽
Vol 72
(0)
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pp. 858
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1976 ◽
Vol 72
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pp. 842
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1983 ◽
Vol 44
(C3)
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pp. C3-1095-C3-1097
2015 ◽
Vol 8
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pp. 2176-2188
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2006 ◽
Vol 220
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pp. 325-333
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1995 ◽
Vol 195
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pp. 329-337
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1975 ◽
Vol 250
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pp. 9021-9027
2021 ◽
Vol 125
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pp. 841-849
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