Electron beam lithography for direct patterning of MoS2 on PDMS substrates
Precise patterning of 2D materials into micro- and nanostructures presents a considerable challenge and many efforts are dedicated to the development of processes alternative to the standard lithography.
1998 ◽
Vol 16
(6)
◽
pp. 3804
◽
2011 ◽
Vol 29
(6)
◽
pp. 06F303
◽
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