scholarly journals Electron beam lithography for direct patterning of MoS2 on PDMS substrates

RSC Advances ◽  
2021 ◽  
Vol 11 (32) ◽  
pp. 19908-19913
Author(s):  
Gil Jumbert ◽  
Marcel Placidi ◽  
Francesc Alzina ◽  
Clivia M. Sotomayor Torres ◽  
Marianna Sledzinska

Precise patterning of 2D materials into micro- and nanostructures presents a considerable challenge and many efforts are dedicated to the development of processes alternative to the standard lithography.

Nanoscale ◽  
2020 ◽  
Vol 12 (20) ◽  
pp. 11306-11316
Author(s):  
Christian D. Dieleman ◽  
Weiyi Ding ◽  
Lianjia Wu ◽  
Neha Thakur ◽  
Ivan Bespalov ◽  
...  

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.


Nanoscale ◽  
2017 ◽  
Vol 9 (43) ◽  
pp. 16755-16763 ◽  
Author(s):  
Kaixi Bi ◽  
Quan Xiang ◽  
Yiqin Chen ◽  
Huimin Shi ◽  
Zhiqin Li ◽  
...  

We report an electron-beam lithography process to directly fabricate graphene@copper composite patterns without involving metal deposition, lift-off and etching processes.


2020 ◽  
Author(s):  
Vito Clericò ◽  
Mario Amado ◽  
Enrique Diez

ACS Nano ◽  
2017 ◽  
Vol 11 (10) ◽  
pp. 9920-9929 ◽  
Author(s):  
Mohammad S. M. Saifullah ◽  
Mohamed Asbahi ◽  
Maryam Binti-Kamran Kiyani ◽  
Sudhiranjan Tripathy ◽  
Esther A. H. Ong ◽  
...  

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