scholarly journals Continuous orientated growth of scaled single-crystal 2D monolayer films

2021 ◽  
Author(s):  
Ziyi Han ◽  
Lin Li ◽  
Fei Jiao ◽  
Gui Yu ◽  
Zhongming Wei ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Deposition Method ◽  
Monolayer Films ◽  
Recent Advances

Recent advances in growing scaled 2D single-crystal monolayer films by the chemical vapor deposition method are comprehensively presented.

scholarly journals Growth of Single-Crystal LiNbO3 Particles by Aerosol-Assisted Chemical Vapor Deposition Method

2019 ◽  
Author(s):  
José G. Murillo ◽  
José A. Ocón ◽  
Guillermo M. Herrera ◽  
José R. Murillo-Ochoa ◽  
Gabriela Ocón
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Deposition Method

Water-assisted growth of large-sized single crystal hexagonal boron nitride grains

2017 ◽  
Vol 1 (9) ◽  
pp. 1836-1840 ◽  
Author(s):  
Lifeng Wang ◽  
Bin Wu ◽  
Hongtao Liu ◽  
Li Huang ◽  
Yongtao Li ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Fast Growth ◽  
Chemical Vapor Deposition Method ◽  
Deposition Method

A water-assisted chemical vapor deposition method is developed for the fast growth of large-sized h-BN single crystal domains.

Controlled growth and ion intercalation mechanism of monocrystalline niobium pentoxide nanotubes for advanced rechargeable aluminum-ion batteries

Nanoscale ◽  
2020 ◽  
Vol 12 (23) ◽  
pp. 12531-12540 ◽  
Author(s):  
Lei Wang ◽  
Huinan Lin ◽  
Weihua Kong ◽  
Yi Hu ◽  
Renpeng Chen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Niobium Pentoxide ◽  
Chemical Vapor Deposition Method ◽  
Controlled Growth ◽  
Deposition Method ◽  
Aluminum Ion ◽  
Ion Intercalation

A chemical vapor deposition method was developed to prepare single-crystal orthogonal Nb2O5 nanotubes for rechargeable aluminum ion batteries, showing a high reversible capability of 556 mA h g−1 at 25 mA g−1 and good thermal endurability at 50 °C.

Anisotropic Plasma ChemicalVapor Deposition of Copper Films in Trenches

2003 ◽  
Vol 766 ◽  
Author(s):  
Kosuke Takenaka ◽  
Masao Onishi ◽  
Manabu Takenshita ◽  
Toshio Kinoshita ◽  
Kazunori Koga ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Deposition Rate ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Anisotropic Plasma ◽  
Bottom Surface ◽  
Chemical Vapor Deposition Method ◽  
Copper Films ◽  
Deposition Method ◽  
Via Holes

AbstractAn ion-assisted chemical vapor deposition method by which Cu is deposited preferentially from the bottom of trenches (anisotropic CVD) has been proposed in order to fill small via holes and trenches. By using Ar + H2 + C2H5OH[Cu(hfac)2] discharges with a ratio H2 / (H2 + Ar) = 83%, Cu is filled preferentially from the bottom of trenches without deposition on the sidewall and top surfaces. The deposition rate on the bottom surface of trenches is experimentally found to increase with decreasing its width.

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