scholarly journals Polyoxoniobates as molecular building blocks in thin films

2021 ◽  
Author(s):  
Mark A. Rambaran ◽  
András Gorzsás ◽  
Michael Holmboe ◽  
C. André Ohlin
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Niobium Oxide ◽  
Building Blocks ◽  
Oxide Thin Film ◽  
Molecular Building Blocks ◽  
Film Synthesis

Crystallinity, thickness, and roughness can be controlled using polyoxoniobates as molecular building blocks in niobium oxide thin film synthesis.

scholarly journals Optoelectronic properties of highly porous silver oxide thin film

2021 ◽  
Vol 3 (1) ◽  
Author(s):  
Ahmad Al-Sarraj ◽  
Khaled M. Saoud ◽  
Abdelaziz Elmel ◽  
Said Mansour ◽  
Yousef Haik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electron Microscope ◽  
Plasma Etching ◽  
Silver Oxide ◽  
Oxidation Time ◽  
Oxide Thin Film ◽  
X Ray ◽  
Porous Silver ◽  
Highly Porous

Abstract In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different plasma etching periods and the number of deposition cycles. The increase of plasma etching and oxidation time increases the surface roughness of the Ag NWs until it fused to form a porous thin film of silver oxide. AgNWs based thin films were characterized using X-ray diffraction, scanning electron microscope, transmission electron microscope, X-ray photoemission spectroscopy, and UV–Vis spectroscopy techniques. The obtained results indicate the formation of mixed mesoporous Ag2O and AgO NW thin films. The Ag2O phase of silver oxide appears after 300 s of oxidation under the same conditions, while the optical transparency of the thin film decreases as plasma etching time increases. The sheet resistance of the final film is influenced by the oxidation time and the plasma application periodicity. Graphic abstract

ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS PREPARED BY R.F. MAGNETRON SPUTTERING

2011 ◽  
Vol 25 (20) ◽  
pp. 2741-2749 ◽  
Author(s):  
J. C. ZHOU ◽  
L. LI ◽  
L. Y. RONG ◽  
B. X. ZHAO ◽  
Y. M. CHEN ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Electrical And Optical Properties ◽  
Axis Orientation ◽  
Sputtering Power

High transparency and conductivity of transparent conducting oxide thin film are very important for improving the efficiency of solar cells. ZnO thin film is a better candidate for transparent conductive layer of solar cell. N-type ZnO thin films were prepared by radio-frequency magnetron sputtering on glass substrates. ZnO thin films underwent annealing treatment after deposition. The influence of the sputtering power on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV2450 and HMS-3000. The experimental results indicate that the crystal quality of ZnO thin film is improved and all films show higher c-axis orientation with increasing sputtering power from 50 to 125 W. The average transparency of ZnO thin films is higher than 90% in the range of 400–900 nm between the sputtering power of 50–100 W. After the rapid thermal annealing at 550°C for 300 s under N2 ambient, the minimum resistivity reach to 10-2Ω⋅ cm .

The Adsorption of Methanol,Water and Ethylene on a Niobium Oxide Thin Film

1998 ◽  
Vol 14 (03) ◽  
pp. 219-225
Author(s):  
Zhong Chong-Min ◽  
◽  
Wang-De-Zheng ◽  
Takashi Ushikubo ◽  
Keisuke Wada
Keyword(s):  
Thin Film ◽  
Niobium Oxide ◽  
Oxide Thin Film

scholarly journals Highly conductive low-temperature combustion-derived transparent indium tin oxide thin film

2021 ◽  
Author(s):  
Longfei Song ◽  
Tony Schenk ◽  
Emmanuel Defay ◽  
Sebastjan Glinsek
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Low Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Thin Film ◽  
Low Temperature Combustion ◽  
Transparent Electronics ◽  
Temperature Combustion ◽  
Ito Thin Films

Highly conductive (conductivity 620 S cm−1) and transparent ITO thin films are achieved at low temperature (350 °C) through effective combustion solution processing via multistep coating. The properties show potential for next generation flexible and transparent electronics.

Chemical durability engineering of solution-processed oxide thin films and its application in chemically-robust patterned oxide thin-film transistors

2017 ◽  
Vol 5 (2) ◽  
pp. 339-349 ◽  
Author(s):  
Sung Woon Cho ◽  
Da Eun Kim ◽  
Won Jun Kang ◽  
Bora Kim ◽  
Dea Ho Yoon ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Treatment ◽  
Thin Film Transistors ◽  
Oxide Films ◽  
Chemical Durability ◽  
Oxide Thin Film ◽  
Large Area ◽  
Solution Processed ◽  
Circuit Integration

The chemical durability of solution-processed oxide films was engineered via Sn-incorporation and thermal-treatment, which was applied for large-area TFT circuit integration.

scholarly journals Ceramic Oxide Thin Film Formation Utilizing Biological Processes

1989 ◽  
Vol 174 ◽  
Author(s):  
B. J. Tarasevich ◽  
P. C. Rieke
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Formation ◽  
Nucleation And Growth ◽  
Oxide Thin Film ◽  
Biological Processes ◽  
Oxide Materials ◽  
Ceramic Oxide ◽  
Mineralization Processes ◽  
Properties Of Materials

AbstracMineralization processes used by bioorganisms have been adapted for the nucleation and growth of ceramic oxide thin films onto surfaces from aqueous solutions. These strategies include the use of surfaces derivatized with specific functional groups that control the nucleation and growth and properties of materials deposited. Iron oxide materials were deposited onto functionalized polystyrene surfaces, resulting in the formation of thin films composed of densely packed, nanometer-sized crystallites. Evidence for the formation of oriented crystallites was found. This process may have advantages over conventional thin film processing methods due to the ability to systematically control properties of materials deposited.

Photon-assisted oxidation and oxide thin film synthesis: A review

2009 ◽  
Vol 54 (7) ◽  
pp. 981-1057 ◽  
Author(s):  
Masaru Tsuchiya ◽  
Subramanian K.R.S. Sankaranarayanan ◽  
Shriram Ramanathan
Keyword(s):  
Thin Film ◽  
Oxide Thin Film ◽  
Film Synthesis
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