scholarly journals A novel precursor towards buffer layer materials: the first solution based CVD of zinc oxysulfide

2020 ◽  
Vol 8 (16) ◽  
pp. 5501-5508 ◽  
Author(s):  
Malavika A. Bhide ◽  
Claire J. Carmalt ◽  
Caroline E. Knapp

We report the first solution based deposition of zinc oxysulfide, Zn(O,S), thin films via aerosol-assisted chemical vapour deposition (AACVD) facilitated by the use of a specifically designed precursor: [Zn8(SOCCH3)12S2] (1).

2000 ◽  
Vol 361-362 ◽  
pp. 172-176 ◽  
Author(s):  
A. Rumberg ◽  
Ch. Sommerhalter ◽  
M. Toplak ◽  
A. Jäger-Waldau ◽  
M.Ch. Lux-Steiner

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.


2001 ◽  
Vol 389 (1-2) ◽  
pp. 34-42 ◽  
Author(s):  
J.P Holgado ◽  
J.P Espinós ◽  
F Yubero ◽  
A Justo ◽  
M Ocaña ◽  
...  

Vacuum ◽  
2021 ◽  
Vol 189 ◽  
pp. 110253
Author(s):  
Yujia Jiao ◽  
Qian Jiang ◽  
Junhua Meng ◽  
Jinliang Zhao ◽  
Zhigang Yin ◽  
...  

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