A novel precursor towards buffer layer materials: the first solution based CVD of zinc oxysulfide
2020 ◽
Vol 8
(16)
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pp. 5501-5508
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Keyword(s):
We report the first solution based deposition of zinc oxysulfide, Zn(O,S), thin films via aerosol-assisted chemical vapour deposition (AACVD) facilitated by the use of a specifically designed precursor: [Zn8(SOCCH3)12S2] (1).