Facile preparation of nickel hydroxide nanoplates on nickel foam for high performance hydrogen generation

2020 ◽  
Vol 4 (10) ◽  
pp. 5031-5035
Author(s):  
Jun Cao ◽  
Zejie Zhang ◽  
Haichao Li ◽  
Ruitong Zhu ◽  
Songbo Li ◽  
...  
Keyword(s):  
Nitric Acid ◽  
Acid Solution ◽  
Nitric Acid Solution ◽  
Nickel Hydroxide ◽  
High Performance ◽  
Hydrogen Generation ◽  
Nickel Foam ◽  
Water Bath ◽  
One Step ◽  
Facile Preparation

This communication reports nickel hydroxide nanoplates grown on nickel foam (NF) by one-step water bath treatment of NF in nitric acid solution.

Selective one-step Chemical Etching of the Silicon Nitride/Silicon PBL stack for 0.5μm device Fabrication

1995 ◽  
Vol 386 ◽  
Author(s):  
David Ziger ◽  
Susan Vitkavage ◽  
Charles Oberdorfer ◽  
Juli Eisenberg ◽  
Michael Hughes
Keyword(s):  
Nitric Acid ◽  
Silicon Nitride ◽  
Acid Solution ◽  
Nitric Acid Solution ◽  
Device Fabrication ◽  
Reaction Products ◽  
One Step ◽  
Wet Chemical ◽  
Etch Rates

ABSTRACTAbstract Wet chemical removal of a silicon nitride/silicon Poly Buffer LOCUS (PBL) film stack with a phosphoric/nitric acid solution was characterized. Though silicon nitride etch rates remain constant, silicon etch rates decrease as a function of loading which severely limits the usable lifetime of the bath. This is caused by buildup of etching products which limits the amount of silicon that can be dissolved in the solution. Addition of HF to the phosphoric/nitric acid solution enhances the dissolution chemistry presumably by decomposing the silica reaction products and shifting the equilibrium. Characterization of this process was done to determine whether it could be applied towards PBL removal. Depending on the relative amounts of HF and HNO3 added, silicon etch rates could be enhanced by two orders of magnitude (200–400A/min) and silicon nitride etch rates by a factor of two. Selectivities for etching silicon to oxide and silicon nitride to oxide were typically between 8–12:1 and 8–20:1 respectively.

scholarly journals Novel pyrimidine-bichalcophene derivatives as corrosion inhibitors for copper in 1 M nitric acid solution

RSC Advances ◽  
2021 ◽  
Vol 11 (41) ◽  
pp. 25314-25333
Author(s):  
Mai A. Khaled ◽  
Mohamed A. Ismail ◽  
Ahmed. A. El-Hossiany ◽  
Abd El-Aziz S. Fouda
Keyword(s):  
Weight Loss ◽  
Electrochemical Impedance Spectroscopy ◽  
Nitric Acid ◽  
Impedance Spectroscopy ◽  
Acid Solution ◽  
Nitric Acid Solution ◽  
Potentiodynamic Polarization ◽  
Corrosion Inhibitors ◽  
Electrochemical Impedance ◽  
Pyrimidine Derivatives

This study targets the investigation of three pyrimidine derivatives (MA-1230, MA-1231, MA-1232) for the prevention of corrosion on copper in 1 M HNO3via weight loss (WL), potentiodynamic polarization (PDP), and electrochemical impedance spectroscopy (EIS) techniques.

scholarly journals The effect of crystal textures on the anodic oxidization of zirconium in a boiling nitric acid solution

2015 ◽  
Vol 53 (9) ◽  
pp. 1371-1379 ◽  
Author(s):  
Chiaki Kato ◽  
Yasuhiro Ishijima ◽  
Fumiyoshi Ueno ◽  
Masahiro Yamamoto
Keyword(s):  
Nitric Acid ◽  
Acid Solution ◽  
Nitric Acid Solution

Influence of Corona Discharge on CaSO4 Solubility of Silicone Rubber Insulator Surface

2021 ◽  
Vol 69 (1) ◽  
pp. 74-79
Author(s):  
Sihua Wang ◽  
Junjun Wang ◽  
Chen Long ◽  
Zhao Lei
Keyword(s):  
Nitric Acid ◽  
Acid Solution ◽  
Corona Discharge ◽  
Nitric Acid Solution ◽  
Silicone Rubber ◽  
Calcium Sulfate ◽  
Salt Composition ◽  
Surface Product ◽  
Two Temperatures ◽  
Discharge Test

Some studies have shown that the operating state of silicone rubber insulators is not only affected by surface corona discharge, but also different due to the surface covered with different pollutants, but few studies have linked the two. In this paper, by designing the corona discharge test of silicone rubber insulator, the output of nitric acid from its surface product was calculated, and the concentration of nitric acid under different air humidity was obtained. The solubility test of slightly dissolved salt calcium sulfate in nitric acid solution at 293.15K and 333.15K was designed to obtain the solubility of calcium sulfate at different concentrations of nitric acid at two temperatures. Finally, a quantitative analysis of the solubility of calcium sulfate on the surface of insulator FXBW-10/70 in nitric acid solution shows that the surface contamination of insulator with good hydrophobicity may be completely dissolved by nitric acid solution, but the surface of insulator with loss of hydrophobicity cannot be completely dissolved by nitric acid. This study provides a theoretical basis for the dissolution characteristics of silicon rubber insulator corona discharge on its surface soluble salt composition and provides a new idea for the influence of insulator corona discharge on its electrical properties.

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