scholarly journals Chemical vapor deposition and temperature-dependent Raman characterization of two-dimensional vanadium ditelluride

RSC Advances ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 2624-2629
Author(s):  
Mongur Hossain ◽  
Muhammad Ahsan Iqbal ◽  
Juanxia Wu ◽  
Liming Xie
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Two Dimensional ◽  
Temperature Dependent ◽  
Pressure Chemical ◽  
Raman Characterization

Two-dimensional vanadium ditelluride has been synthesized on mica, sapphire, and h-BN substrates by atmospheric pressure chemical vapor deposition.

Effect on Catalytic Activity and Characterization of Content of V2O5-WO3 by Chemical Vapor Deposition

2011 ◽  
Vol 393-395 ◽  
pp. 1177-1180
Author(s):  
Mei Yang ◽  
Ben Ou ◽  
Li Jun Yan
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Removal Rate ◽  
Average Pore Size ◽  
Chemical Vapor ◽  
Average Pore ◽  
Hole Area ◽  
Pressure Chemical

The honeycomb cordierite, loaded with carrier TiO2 by atmospheric pressure chemical vapor deposition (APCVD), was to produce the V2O5-WO3/TiO2 catalyst by impregnation process. The paper presents the effect of the content of V2O5 and WO3 on the catalyst by analyzing the microstructure and ingredients of catalyst by means of SEM, BET, XRD and EDS. The results show that the BET of the catalyst composed by 2.1%V2O5-8.2%WO3/TiO2 is 854.33m²•g-1 , Its hole area is 73.56 m2•g-1, the average pore size is 9.8nm,the main phase is Mg2Al4Si5O18,anatase-TiO2 and WO3.The distribution of vanadium monomer on the carrier TiO2 prepared by APCVD is monolayer, and minim particle is acicular. The NO removal rate (ηNO/%) of the catalyst with 2.1%V2O5 and 8.2%WO3 achieves 98.9%.

Preparation and characterization of ZnO nanotripods and nanoflowers by atmospheric pressure chemical vapor deposition (APCVD) technique

2018 ◽  
Author(s):  
Abdul Hameed R. Al-Sarraf ◽  
Ziad. T. Khodair ◽  
M. I. Manssor ◽  
Rola Abdul Al Khader Abbas ◽  
Auday H. Shaban
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Pressure Chemical

scholarly journals Characterization of TiN film grown by low-pressure-chemical-vapor-deposition

1997 ◽  
Vol 308-309 ◽  
pp. 594-598 ◽  
Author(s):  
Y.J Mei ◽  
T.C Chang ◽  
J.C Hu ◽  
L.J Chen ◽  
Y.L Yang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Tin Film ◽  
Pressure Chemical

Growth of Single-Crystal Pyrite Films by Atmospheric Pressure Chemical Vapor Deposition

2003 ◽  
Vol 15 (9) ◽  
pp. 1763-1765 ◽  
Author(s):  
Naoyuki Takahashi ◽  
Yusuke Nakatani ◽  
Takuma Yatomi ◽  
Takato Nakamura
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Pressure Chemical

Characterization of InN layers grown by high-pressure chemical vapor deposition

2006 ◽  
Vol 89 (11) ◽  
pp. 112119 ◽  
Author(s):  
M. Alevli ◽  
G. Durkaya ◽  
A. Weerasekara ◽  
A. G. U. Perera ◽  
N. Dietz ◽  
...  
Keyword(s):  
High Pressure ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Pressure Chemical

scholarly journals Epitaxial Growth of Magnesia Films on Single Crystalline Magnesia Substrates by Atmospheric-Pressure Chemical Vapor Deposition

2016 ◽  
Vol 5 (2) ◽  
pp. 56
Author(s):  
Keiji Komatsu ◽  
Pineda Marulanda David Alonso ◽  
Nozomi Kobayashi ◽  
Ikumi Toda ◽  
Shigeo Ohshio ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Reciprocal Lattice ◽  
Chemical Vapor ◽  
X Ray ◽  
Pole Figures ◽  
Out Of Plane ◽  
Pressure Chemical

<p class="1Body">MgO films were epitaxially grown on single crystal MgO substrates by atmospheric-pressure chemical vapor deposition (CVD). Reciprocal lattice mappings and X-ray reflection pole figures were used to evaluate the crystal quality of the synthesized films and their epitaxial relation to their respective substrates. The X-ray diffraction profiles indicated that the substrates were oriented out-of-plane during MgO crystal growth. Subsequent pole figure measurements showed how all the MgO films retained the substrate in-plane orientations by expressing the same pole arrangements. The reciprocal lattice mappings indicated that the whisker film showed a relatively strong streak while the continuous film showed a weak one. Hence, highly crystalline epitaxial MgO thin films were synthesized on single crystal MgO substrates by atmospheric-pressure CVD.</p>

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