An integrated and multi-technique approach to characterize airborne graphene flakes in the workplace during production phases

Nanoscale ◽  
2021 ◽  
Vol 13 (6) ◽  
pp. 3841-3852 ◽  
Author(s):  
Francesca Tombolini ◽  
Fabio Boccuni ◽  
Riccardo Ferrante ◽  
Claudio Natale ◽  
Luigi Marasco ◽  
...  

Workplace exposure to airborne few layer graphene: real time measurements (PNC, average diameter and LDSA) and characterization technique using electron microscopes (SEM, EDS, TEM, SAED) and Raman spectroscopy.

2019 ◽  
Vol 29 (1) ◽  
pp. 47-49 ◽  
Author(s):  
Muhammad Yasir ◽  
Silvia Bistarelli ◽  
Antonino Cataldo ◽  
Maurizio Bozzi ◽  
Luca Perregrini ◽  
...  

2016 ◽  
Vol 117 (14) ◽  
Author(s):  
W. Yan ◽  
L. C. Phillips ◽  
M. Barbone ◽  
S. J. Hämäläinen ◽  
A. Lombardo ◽  
...  

2018 ◽  
Vol 20 (3) ◽  
pp. 2022-2027 ◽  
Author(s):  
Meifen Li ◽  
Weiwei Liu ◽  
Haixia Zhang ◽  
Zhilu Liang ◽  
Pei Duan ◽  
...  

Atomic-scale electron microscopy of carbon onions at intermediary growth stages suggests that carbon onions are constructed by few-layer graphene flakes.


2008 ◽  
Vol 600-603 ◽  
pp. 567-570 ◽  
Author(s):  
Jonas Röhrl ◽  
Martin Hundhausen ◽  
Konstantin V. Emtsev ◽  
Thomas Seyller ◽  
Lothar Ley

We present a micro-Raman spectroscopy study on single- and few layer graphene (FLG) grown on the silicon terminated surface of 6H-silicon carbide (SiC). On the basis of the 2D-line (light scattering from two phonons close to the K-point in the Brillouin zone) we distinguish graphene mono- from bilayers or few layer graphene. Monolayers have a 2D-line consisting of only one component, whereas more than one component is observed for thicker graphene layers. Compared to the graphite the monolayer graphene lines are shifted to higher frequencies. We tentatively ascribe the corresponding phonon hardening to strain in the first graphene layer.


2012 ◽  
Vol 116 (35) ◽  
pp. 19046-19050 ◽  
Author(s):  
Martin Kalbac ◽  
Jing Kong ◽  
Mildred S. Dresselhaus

Nano Letters ◽  
2013 ◽  
Vol 13 (10) ◽  
pp. 4620-4623 ◽  
Author(s):  
Davide Boschetto ◽  
Leandro Malard ◽  
Chun Hung Lui ◽  
Kin Fai Mak ◽  
Zhiqiang Li ◽  
...  

2014 ◽  
Vol 778-780 ◽  
pp. 1162-1165
Author(s):  
Enrique Escobedo-Cousin ◽  
Konstantin Vassilevski ◽  
Toby Hopf ◽  
Nicholas Wright ◽  
Anthony G. O'Neill ◽  
...  

This work presents experimental evidence of the formation mechanisms of few-layer graphene (FLG) films on SiC by nickel silicidation. FLG is formed by annealing of a 40 nm thick Ni layer on 6H-SiC at 1035ºC for 60 s, resulting in a Ni2Si layer which may be capped by any Ni that did not react during annealing. It has been proposed that FLG forms on top of the Ni during the high temperature stage. In contrast, during cooling, carbon atoms which were released during the silicidation reaction may diffuse back towards the Ni2Si/SiC interface to form a second FLG film. After annealing, layer-by-layer de-processing was carried out in order to unequivocally identify the FLG at each location using Atomic force microscopy (AFM) and Raman spectroscopy.


2014 ◽  
Vol T162 ◽  
pp. 014025 ◽  
Author(s):  
D N Kleut ◽  
Z M Marković ◽  
I D Holclajtner Antunović ◽  
M D Dramićanin ◽  
D P Kepić ◽  
...  

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