scholarly journals High-speed photographic study of vaporclouds from wet droplets and the subsequent solid particles in an inductively coupled plasma

2020 ◽  
Vol 35 (9) ◽  
pp. 1956-1958
Author(s):  
Christopher H. Ebert ◽  
Nathan J. Saetveit ◽  
Stanley J. Bajic ◽  
Daniel S. Zamzow ◽  
David P. Baldwin ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
High Speed ◽  
Solid Particles ◽  
Large Droplet ◽  
Droplet Cloud ◽  
Inductively Coupled

Horizontal ICP with large droplet cloud showing YO and neutral Y emission.

Plasma-Assisted Nitriding in Low-Frequency Inductively Coupled Plasma Enhanced with Ferromagnetic Cores

2018 ◽  
Vol 37 (6) ◽  
pp. 545-550
Author(s):  
Mikhail Isupov ◽  
Vadim Pinaev ◽  
Daria Mul ◽  
Natalia Belousova
Keyword(s):  
Inductively Coupled Plasma ◽  
High Speed ◽  
Low Frequency ◽  
Sample Surface ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Steel Aisi ◽  
Current Densities ◽  
Aisi 321 ◽  
Stainless Steel Aisi

AbstractAn experimental investigation of plasma-assisted nitriding of austenitic stainless steel AISI 321 in a low-pressure (7 Pa), low-frequency (50–100 kHz) nitrogen inductively coupled plasma enhanced with ferromagnetic cores has been performed at the temperatures of 470–625 °C, sample biases of ‒500–‒750 V, current densities on the sample surface of 1.2–3.3 mA/cm2 and nitriding times of 20 and 60 min. It is found that even the short (20 min) ion-plasma treatment results in the formation of nitrided layers with the thickness of up to 40 μm and microhardness of up to 9 GPa.The high speed of nitriding can be explained as a result of the joint action of high ion flux density and high ion energy on the sample surface.

High-Speed Etching of Indium-Tin-Oxide Thin Films Using an Inductively Coupled Plasma

1994 ◽  
Vol 33 (Part 1, No. 7B) ◽  
pp. 4438-4441 ◽  
Author(s):  
Keiji Nakamura ◽  
Tomonori Imura ◽  
Hideo Sugai ◽  
Michiko Ohkubo ◽  
Katsutaro Ichihara
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Inductively Coupled Plasma ◽  
High Speed ◽  
Oxide Thin Films ◽  
Inductively Coupled

scholarly journals Conversion of a sequential inductively coupled plasma emission spectrometer into a multichannel simultaneous system using a photodiode array detector

1998 ◽  
Vol 20 (3) ◽  
pp. 69-75 ◽  
Author(s):  
Maria Fernanda Pimentel ◽  
Mário César Ugulino Araújo ◽  
Benício de Barros Neto ◽  
Célio Pasquini
Keyword(s):  
Inductively Coupled Plasma ◽  
High Speed ◽  
Detection System ◽  
Array Detector ◽  
Plasma Emission ◽  
Inductively Coupled ◽  
Water Matrix ◽  
Simultaneous System ◽  
Photodiode Array Detector ◽  
Photodiode Array

A monochannel plasma emission spectrometer was converted to a multichannel instrument by the introduction of a detection system based on an array of 1024 photodiodes and a low-resolution dispersion device. The new, relatively inexpensive equipment, features both the high speed typical of simultaneous instruments and the versatility of scanning systems. This paper reports on an evaluation of the modified equipment for quantitative analysis with the simultaneous determination of Al, Mn, Mg, Ca, Fe and Cu in a natural water matrix. An average relative prediction error of 2.4% was found which is the same as the error obtained with the conventional analytical method. Data acquisition with the modified instrument is up to 40 times faster.

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