scholarly journals A prospective microwave plasma source for in situ spaceflight applications

2020 ◽  
Vol 35 (11) ◽  
pp. 2740-2747
Author(s):  
B. J. Farcy ◽  
R. D. Arevalo ◽  
M. Taghioskoui ◽  
W. F. McDonough ◽  
M. Benna ◽  
...  
Keyword(s):  
Low Power ◽  
Organic Molecules ◽  
Microwave Plasma ◽  
Plasma Source ◽  
Reduced Pressure ◽  
Planetary Environments ◽  
Refractory Elements

We report full ionization of organic molecules or refractory elements with a low power and reduced-pressure microwave plasma source that can be applied to any specific analyzer for deployment in remote terrestrial and planetary environments.

Uranium emission spectra with a low power microwave plasma source

2005 ◽  
Vol 532 (1) ◽  
pp. 47-54 ◽  
Author(s):  
Yixiang Duan ◽  
Susan T. Scherrer ◽  
Sudip P. Koirala ◽  
Chuji Wang ◽  
Christopher B. Winstead
Keyword(s):  
Low Power ◽  
Microwave Plasma ◽  
Emission Spectra ◽  
Plasma Source ◽  
Power Microwave

Ultrafast Deposition of Crystalline Si Films Using a High Density Microwave Plasma

2010 ◽  
Vol 1245 ◽  
Author(s):  
Haijun Jia ◽  
Michio Kondo
Keyword(s):  
Film Growth ◽  
Microwave Plasma ◽  
Crystalline Silicon ◽  
Plasma Source ◽  
Ambient Air ◽  
Film Deposition ◽  
High Density ◽  
Silicon Films ◽  
Reduced Pressure ◽  
Si Films

AbstractA multi-pressure microwave plasma source is developed and is applied for the fast deposition of crystalline silicon films. In this paper, the plasma source is diagnosed firstly. Electron density, electron temperature and discharge gas temperature of the plasmas generated in ambient air are studied using optical emission spectroscopy (OES) method. By using the high density microwave plasma source, depositions of crystalline silicon films from SiH4+He mixture at reduced pressure conditions are investigated systematically. After optimizing the film deposition conditions, highly crystallized Si films are deposited at a rate higher than 700 nm/s. We also find that the deposited films are fully crystallized and crystalline structure of the deposited film evolves along the film growth direction, i.e. large grains in surface region while small grains in the bottom region of the film. Based on the observed results, a possible mechanism, the annealing-assisted plasma-enhanced chemical vapor deposition, is proposed to describe the film growth process.

Experimental Evidence for the Dominance of vuv Photons in Remote Hydrogen Plasma Treatments

1998 ◽  
Vol 544 ◽  
Author(s):  
R. Wilken ◽  
A. Hollander ◽  
J. Behnisch
Keyword(s):  
Vacuum Ultraviolet ◽  
Microwave Plasma ◽  
Hydrogen Plasma ◽  
Plasma Source ◽  
Power Input ◽  
Photon Flux ◽  
Fluorescence Measurements ◽  
Plasma Treatments ◽  
Uv Photons

AbstractThe flux of vacuum ultraviolet (VUV) and ultraviolet (UV) photons from a hydrogen plasma was detected by fluorescence measurements of sodium salicylate sheets with and without a MgF2 window. In order to expose the samples to the same photon flux in all experiments, the power input to the microwave plasma source was adjusted. Polyethylene (PE), polypropylene (PP), and polystyrene (PS) were treated with VUV radiation or with a remote hydrogen plasma. The mass loss and the CH-absorption loss were recorded by in situ quartz crystal micro balance and by in situ IR reflection absorption spectroscopy, respectively. The VUV irradiation and plasma treatment caused similar effects in the case of PE, PP showed an increased polymer ablation in plasma treatments, and for PS a negligible loss in mass and CH absorption was detected in plasma and VUV treatments.

Low-power microwave plasma source for chromatography detection

1985 ◽  
Vol 40 (1-2) ◽  
pp. 307-316 ◽  
Author(s):  
G.W. Jansen ◽  
F.A. Huf ◽  
H.J. de Jong
Keyword(s):  
Low Power ◽  
Microwave Plasma ◽  
Plasma Source ◽  
Power Microwave

scholarly journals Safe and Effective Use of Ozone as Air and Surface Disinfectant in the Conjuncture of Covid-19

Gases ◽  
2020 ◽  
Vol 1 (1) ◽  
pp. 19-32
Author(s):  
Elena Grignani ◽  
Antonella Mansi ◽  
Renato Cabella ◽  
Paola Castellano ◽  
Angelo Tirabasso ◽  
...  
Keyword(s):  
Organic Molecules ◽  
Scientific Literature ◽  
Toxic Substance ◽  
Health And Safety ◽  
Emergency Situation ◽  
Ambient Air ◽  
Public Places ◽  
Safety Measures ◽  
Effective Use

The present paper extrapolates quantitative data for ozone virucidal activity on the basis of the available scientific literature data for a safe and effective use of ozone in the appropriate cases and to explore the safety measures developed under the stimulus of the current emergency situation. Ozone is a powerful oxidant reacting with organic molecules, and therefore has bactericidal, virucidal, and fungicidal actions. At the same time, it is a toxic substance, having adverse effects on health and safety. Its use is being proposed for the disinfection of workplaces’ and public places’ atmosphere, and for disposable masks and personal protective equipment disinfection for reuse, with particular reference to the COVID-19 pandemic outbreak. Ozone can be generated in situ by means of small, compact ozone generators, using dried ambient air as a precursor. It should be injected into the room that is to be disinfected until the desired ozone concentration is reached; after the time needed for the disinfection, its concentrations must be reduced to the levels required for the workers’ safety. The optimal use of ozone is for air and surface disinfection without human presence, using a concentration that is effective for the destruction of viruses, but not high enough to deteriorate materials.

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