Atomic-scale engineering of chemical-vapor-deposition-grown 2D transition metal dichalcogenides for electrocatalysis

2020 ◽  
Vol 13 (6) ◽  
pp. 1593-1616 ◽  
Author(s):  
Qichen Wang ◽  
Yongpeng Lei ◽  
Yuchao Wang ◽  
Yi Liu ◽  
Chengye Song ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Transition Metal Dichalcogenides ◽  
Chemical Vapor ◽  
Atomic Scale ◽  
Electrocatalytic Properties ◽  
Metal Dichalcogenides

Focusing on the atomic-scale engineering of CVD grown 2D TMDs, we discuss the six engineering strategies to tailor the electronic structure, conductivity and electrocatalytic properties in detail. Finally, challenges and perspectives are addressed.

Controlled fractal growth of transition metal dichalcogenides

Nanoscale ◽  
2019 ◽  
Vol 11 (36) ◽  
pp. 17065-17072
Author(s):  
Peijian Wang ◽  
Siyuan Luo ◽  
Lincoln Boyle ◽  
Hao Zeng ◽  
Shaoming Huang
Keyword(s):  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Morphological Evolution ◽  
Transition Metal Dichalcogenides ◽  
Chemical Vapor ◽  
Fractal Growth ◽  
Metal Dichalcogenides

We report controlled fractal growth of atomically thin transition metal dichalcogenides (TMDCs) by chemical vapor deposition, with morphological evolution from dendritic to triangular.

Large-area synthesis of transition metal dichalcogenides via CVD and solution-based approaches and their device applications

Nanoscale ◽  
2021 ◽  
Author(s):  
Anh Tuan Hoang ◽  
Kairui Qu ◽  
Xiang Chen ◽  
Jong-Hyun Ahn
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Transition Metal Dichalcogenides ◽  
Chemical Vapor ◽  
Large Area ◽  
Wafer Scale ◽  
Metal Dichalcogenides ◽  
Device Applications

This article reviews the latest advances in the synthesis of wafer-scale thin films using chemical vapor deposition and solution-based methods and various device applications.

scholarly journals Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers

2019 ◽  
Vol 1 (3) ◽  
pp. 953-960 ◽  
Author(s):  
Mei Er Pam ◽  
Yumeng Shi ◽  
Junping Hu ◽  
Xiaoxu Zhao ◽  
Jiadong Dan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Metal Oxide ◽  
Vapor Deposition ◽  
Transition Metal Dichalcogenides ◽  
Chemical Vapor ◽  
Transition Metal Oxide ◽  
Oxide Powders ◽  
Metal Dichalcogenides ◽  
Pre Treatment

Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD).

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