scholarly journals Shock wave and modelling study of the dissociation kinetics of C2F5I

2021 ◽  
Vol 23 (7) ◽  
pp. 4394-4403
Author(s):  
C. J. Cobos ◽  
L. Sölter ◽  
E. Tellbach ◽  
J. Troe
Keyword(s):  
Shock Wave ◽  
Shock Waves ◽  
Thermal Dissociation ◽  
Uv Absorption ◽  
Reaction Products ◽  
Dissociation Kinetics ◽  
Kinetics Of ◽  
Modelling Study

The thermal dissociation of C2F5I was studied in shock waves monitoring UV absorption signals from the reactant C2F5I and later formed reaction products such as CF, CF2, and C2F4.

scholarly journals Shock wave and modelling study of the unimolecular dissociation of Si(CH3)2F2: an access to spectroscopic and kinetic properties of SiF2+

2021 ◽  
Author(s):  
Jurgen Troe ◽  
Carlos J Cobos ◽  
Lars Soelter ◽  
Elsa Tellbach
Keyword(s):  
Shock Wave ◽  
Shock Waves ◽  
Thermal Dissociation ◽  
Uv Absorption ◽  
Kinetic Properties ◽  
Unimolecular Dissociation ◽  
Absorption Time ◽  
Time Profiles ◽  
Reaction Proceeds ◽  
Modelling Study

The thermal dissociation of Si(CH3)2F2 was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF2 and CH3 were monitored. The reaction proceeds...

scholarly journals Shock wave study and theoretical modeling of the thermal decomposition of c-C4F8

2015 ◽  
Vol 17 (48) ◽  
pp. 32219-32224 ◽  
Author(s):  
C. J. Cobos ◽  
K. Hintzer ◽  
L. Sölter ◽  
E. Tellbach ◽  
A. Thaler ◽  
...  
Keyword(s):  
Shock Wave ◽  
Thermal Decomposition ◽  
Shock Waves ◽  
Thermal Dissociation ◽  
Theoretical Modeling ◽  
Uv Absorption

The thermal dissociation of octafluorocyclobutane, c-C4F8, was studied in shock waves over the range 1150–2300 K by recording UV absorption signals of CF2.

scholarly journals Shock wave and modelling study of the dissociation pathways of (C2F5)3N

2019 ◽  
Vol 21 (19) ◽  
pp. 9785-9792
Author(s):  
C. J. Cobos ◽  
K. Hintzer ◽  
L. Sölter ◽  
E. Tellbach ◽  
A. Thaler ◽  
...  
Keyword(s):  
Shock Wave ◽  
Thermal Decomposition ◽  
Shock Waves ◽  
Modelling Study

The thermal decomposition of perfluorotriethylamine, (C2F5)3N, was investigated in shock waves by monitoring the formation of CF2.

Shock wave studies of the pyrolysis of fluorocarbon oxygenates. II. The thermal dissociation of C4F8O

2017 ◽  
Vol 19 (4) ◽  
pp. 3159-3164 ◽  
Author(s):  
C. J. Cobos ◽  
K. Hintzer ◽  
L. Sölter ◽  
E. Tellbach ◽  
A. Thaler ◽  
...  
Keyword(s):  
Shock Wave ◽  
Thermal Decomposition ◽  
Shock Waves ◽  
Thermal Dissociation

The thermal decomposition of octafluorooxalane, C4F8O, to C2F4 + CF2 + COF2 has been studied in shock waves in Ar between 1300 and 2200 K. Two pathways were identified.

Shock wave studies of the pyrolysis of fluorocarbon oxygenates. I. The thermal dissociation of C3F6O and CF3COF

2017 ◽  
Vol 19 (4) ◽  
pp. 3151-3158 ◽  
Author(s):  
C. J. Cobos ◽  
K. Hintzer ◽  
L. Sölter ◽  
E. Tellbach ◽  
A. Thaler ◽  
...  
Keyword(s):  
Shock Wave ◽  
Thermal Decomposition ◽  
Shock Waves ◽  
Thermal Dissociation ◽  
Hexafluoropropylene Oxide ◽  
Subsequent Decomposition

The thermal decomposition of hexafluoropropylene oxide, C3F6O, to perfluoroacetyl fluoride, CF3COF, and CF2 has been studied in shock waves in Ar between 630 and 1000 K. The subsequent decomposition of CF3COF has been followed between 1400 and 1900 K.

Kinetics of the Thermal Dissociation of N2F4 in Shock Waves

1968 ◽  
Vol 49 (2) ◽  
pp. 629-637 ◽  
Author(s):  
A. P. Modica ◽  
D. F. Hornig
Keyword(s):  
Shock Waves ◽  
Thermal Dissociation ◽  
Kinetics Of

Experimental and modelling study of the multichannel thermal dissociations of CH3F and CH2F

2018 ◽  
Vol 20 (4) ◽  
pp. 2627-2636 ◽  
Author(s):  
C. J. Cobos ◽  
G. Knight ◽  
L. Sölter ◽  
E. Tellbach ◽  
J. Troe
Keyword(s):  
Shock Waves ◽  
Uv Absorption ◽  
Unimolecular Dissociation ◽  
Dissociation Product ◽  
Modelling Study

The thermal unimolecular dissociation of CH3F was studied in shock waves by monitoring the UV absorption of a dissociation product identified as CH2F.

Physical Model and Numerical Results of Dissociation Kinetics of Hydrogen-Passivated Si/SiO2 Interface Defects

1997 ◽  
Vol 490 ◽  
Author(s):  
G. V. Gadiyak
Keyword(s):  
Thermal Dissociation ◽  
Defect States ◽  
Dissociation Kinetics ◽  
Silicon Dioxide Film ◽  
Passivated Silicon ◽  
Silicon Defects ◽  
Kinetics Of ◽  
And Diffusion ◽  
Different Thickness ◽  
Dioxide Film

ABSTRACTA simple model of thermal dissociation and recovery of hydrogen-passivated silicon defects at the Si/SiO2 interface, such as Pb - centers, during vacuum thermal annealing has been suggested. This model considers reactions of hydrogen with defect states at the Si/SiO2 interface and diffusion of liberated atomic and molecular hydrogen in a silicon dioxide film. An excellent agreement was obtained between the experimental and numerical simulation results for oxides with different thickness (200–1024 Å), grown both (111) and (100) samples and annealed in the temperature range (480–700° C).

Studies of the Microscopic Nature of Cu-Pairs in Silicon

1998 ◽  
Vol 510 ◽  
Author(s):  
A.A. Istratov ◽  
T. Heiser ◽  
H. Hieslmair ◽  
C. Flink ◽  
E.R. Weber
Keyword(s):  
Nearest Neighbor ◽  
Emission Rate ◽  
Thermal Dissociation ◽  
Depletion Region ◽  
Dissociation Kinetics ◽  
Neutral Impurity ◽  
Donor Acceptor ◽  
Singly Charged ◽  
Charged Ions ◽  
Kinetics Of

AbstractStudies of the thermal dissociation kinetics of Cu-pairs in p-type silicon revealed that the dissociation energy of the pairs is 1.02±0.07 eV, which is twice as large as the binding energy of a coulombically bound donor-acceptor pairs formed by singly charged ions placed on nearest neighbor <111> sites. The dependence of the hole emission rate from the center versus electric field in the depletion region was found to be much weaker than predicted by the Pool-Frenkel law. On the other hand, the polarization potential describing emission from a neutral impurity gave a satisfactory fit to the experimental data. It is concluded that the Cu-pair is a donor with either covalent or mixed type of bonding of interstitial and substitutional copper atoms.

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