Modulation of the adsorption chemistry of a precursor in atomic layer deposition to enhance the growth per cycle of a TiO2 thin film

2021 ◽  
Author(s):  
Yeonchoo Cho ◽  
Sang Hyeon Kim ◽  
Byung Seok Kim ◽  
Youngjin Kim ◽  
Woojin Jeon
Keyword(s):  
Thin Film ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Chemical Reaction ◽  
Tio2 Thin Film ◽  
Dft Calculation ◽  
Atomic Layer ◽  
Growth Behaviour ◽  
Chemical Reaction Mechanism ◽  
Layer Deposition

This study investigates the chemical reaction mechanism of the ALD to obtain a designated growth behaviour in theoretical and experimental way, hence, provides significant implications for understanding the ALD mechanism based on the DFT calculation.

scholarly journals Atomic layer deposition of Al2O3 process emissions

RSC Advances ◽  
2015 ◽  
Vol 5 (17) ◽  
pp. 12824-12829 ◽  
Author(s):  
Lulu Ma ◽  
Dongqing Pan ◽  
Yuanyuan Xie ◽  
Chris Yuan
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Chemical Reaction ◽  
Atomic Layer ◽  
Chemical Reaction Mechanism ◽  
Layer Deposition

The ALD process emissions and the associated chemical reaction mechanism inside the ALD of Al2O3 system are studied and reported.

Brookite TiO2 Thin Film Epitaxially Grown on (110) YSZ Substrate by Atomic Layer Deposition

2014 ◽  
Vol 6 (15) ◽  
pp. 11817-11822 ◽  
Author(s):  
Dai-Hong Kim ◽  
Won-Sik Kim ◽  
Sungtae Kim ◽  
Seong-Hyeon Hong
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Tio2 Thin Film ◽  
Atomic Layer ◽  
Layer Deposition

Gamma Induced Structural and Optical Changes of TiO2 Thin Film Deposited by Atomic Layer Deposition

2018 ◽  
Vol 13 (11) ◽  
pp. 1701-1704 ◽  
Author(s):  
Syed Mansoor Ali ◽  
M. S. Al Garawi ◽  
S. S. Al-Ghamdi ◽  
Muhammad Hammad Aziz ◽  
Turki S. Alkhuraiji ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Tio2 Thin Film ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study

RSC Advances ◽  
2018 ◽  
Vol 8 (68) ◽  
pp. 39039-39046 ◽  
Author(s):  
Hwanyeol Park ◽  
Sungwoo Lee ◽  
Ho Jun Kim ◽  
Daekwang Woo ◽  
Jong Myeong Lee ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
First Principles ◽  
Dft Calculation ◽  
Atomic Layer ◽  
Deposition Cycle ◽  
Atomic Layer Deposition Cycle ◽  
First Principles Study ◽  
Layer Deposition ◽  
Dissociative Reactions

We investigated the overall ALD reaction mechanism for W deposition on TiN surfaces based on DFT calculation as well as the detailed dissociative reactions of WF6.

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