An optimized protocol for high precision measurement of 87Sr/86Sr using a Neptune Plus multi-collector inductively coupled plasma mass spectrometer: evaluation of different cone combinations for Sr isotope determination

2020 ◽  
Vol 12 (32) ◽  
pp. 4089-4096
Author(s):  
Ting Zhou ◽  
Liang Qi ◽  
Haifeng Fan ◽  
Runsheng Yin
Keyword(s):  
Flow Rate ◽  
Precision Measurement ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Sr Isotope ◽  
Gas Flow Rate ◽  
High Precision Measurement ◽  
Inductively Coupled ◽  
Optimized Protocol ◽  
Isotope Determination

The effect of sample gas flow rate on the β88Sr/86Sr of the two cone combinations.

Theoretical Aspects and Design of a Low-Power, Low-Flow-Rate Torch in Inductively Coupled Plasma Atomic Emission Spectroscopy

1984 ◽  
Vol 38 (5) ◽  
pp. 647-653 ◽  
Author(s):  
G Angleys ◽  
J. M. Mermet
Keyword(s):  
Flow Rate ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Atomic Emission ◽  
Low Flow ◽  
Gas Flow Rate ◽  
Inductively Coupled ◽  
Torch Design ◽  
Practical Design ◽  
Main Influence

Based on a previously published work, calculations of the minimum plasma gas flow rate for torch tubes of various dimensions have been performed Predicted minimum rates have been verified by experiment It is possible to sustain a discharge at 600 W and 6 L/min without reducing drastically the external size of the torch One of the main parameters in torch design is the various flow velocities The main influence on the plasma gas flow rate is provided by the space between the external and the intermediate tube A practical design is proposed and a comparison is made with the literature

Characterization of matrix effects using an inductively coupled plasma-sector field mass spectrometer

2020 ◽  
Vol 35 (9) ◽  
pp. 2033-2056 ◽  
Author(s):  
Shi Jiao ◽  
John W. Olesik
Keyword(s):  
Flow Rate ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Matrix Effects ◽  
Mass Matrix ◽  
Gas Flow Rate ◽  
Field Mass ◽  
Inductively Coupled ◽  
Comprehensive Characterization

Comprehensive characterization of ICP-SFMS matrix effects as function of analyte mass, matrix mass, focus lens voltage and nebulizer gas flow rate.

scholarly journals Computational Fluid Dynamics (CFD) Simulations and Experimental Measurements in an Inductively-Coupled Plasma Generator Operating at Atmospheric Pressure: Performance Analysis and Parametric Study

Processes ◽  
2019 ◽  
Vol 7 (3) ◽  
pp. 133 ◽  
Author(s):  
Sangeeta Punjabi ◽  
Dilip Barve ◽  
Narendra Joshi ◽  
Asoka Das ◽  
Dushyant Kothari ◽  
...  
Keyword(s):  
Fluid Dynamics ◽  
Atmospheric Pressure ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Rf Power ◽  
Gas Flow Rate ◽  
Inductively Coupled ◽  
Plasma Resistance ◽  
Computational Fluid Dynamics Cfd ◽  
Icp Torch

In this article, electrical characteristics of a high-power inductively-coupled plasma (ICP) torch operating at 3 MHz are determined by direct measurement of radio-frequency (RF) current and voltage together with energy balance in the system. The variation of impedance with two parameters, namely the input power and the sheath gas flow rate for a 50 kW ICP is studied. The ICP torch system is operated at near atmospheric pressure with argon as plasma gas. It is observed that the plasma resistance increases with an increase in the RF-power. Further, the torch inductance decreases with an increase in the RF-power. In addition, plasma resistance and torch inductance decrease with an increase in the sheath gas flow rate. The oscillator efficiency of the ICP system ranges from 40% to 80% with the variation of the Direct current (DC) powers. ICP has also been numerically simulated using Computational Fluid Dynamics (CFD) to predict the impedance profile. A good agreement was found between the CFD predictions and the impedance experimental data published in the literature.

High Rate Growth of Highly-Crystallized Ge Films on Quartz from VHF Inductively-Coupled Plasma of GeH4 + H2

2007 ◽  
Vol 561-565 ◽  
pp. 1209-1212 ◽  
Author(s):  
Tsutomu Sakata ◽  
Katsunori Makihara ◽  
Hidenori Deki ◽  
Seiichiro Higashi ◽  
Seiichi Miyazaki
Keyword(s):  
Growth Rate ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
High Rate ◽  
Gas Flow Rate ◽  
Inductively Coupled ◽  
A Value ◽  
Disordered Phase ◽  
Integrated Intensity ◽  
Effective Growth

We have studied uniform growth of crystalline Ge films on quartz plate from VHF (60MHz)-ICP of 10% GeH4 diluted with H2 in the temperature range from 150 to 350°C. By optimizing total gas flow rate, gas pressure, VHF power and antenna-substrate distance, the growth rate as high as 7.4nm/s was obtained at 150°C and increased gradually up to ~7.9nm/s at 350°C. The crystallinity, which was evaluated by Raman scattering measurements as an integrated intensity ratio of TO phonons in crystalline phase to those in disordered phase, reached a value as high as ~93 % at 350°C, but degraded down to 64% at 150°C as a result of the formation of a 60~70nm-thick amorphous incubation (A. I.) layer on quartz. By applying a two-step deposition method at 150°C, in which the GeH4 concentration was selected to be 0.6% for the crystalline nucleation in the first 10s deposition, being as thin as 10nm in thickness, and then changed to 10% GeH4 for the high rate growth, the crystallinity was improved to 78% with keeping an effective growth rate as high as 7.5nm/s, because of a significant increase in the growth rate after the crystalline nucleation.

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