Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
2019 ◽
Vol 7
(40)
◽
pp. 12532-12543
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Keyword(s):
Careful interface design and engineering are “keys” to effectively implement a conformal 10 nm plasma-assisted atomic-layer-deposited NiO film as hole transport layer in a p–i–n perovskite solar cell architecture.
2018 ◽
Vol 33
(11)
◽
pp. 115016
◽
Keyword(s):
Keyword(s):
Keyword(s):
2016 ◽
Vol 29
(4)
◽
pp. 581-586
◽
Keyword(s):
2017 ◽
Vol 5
(14)
◽
pp. 6597-6605
◽
2019 ◽
Vol 9
(1)
◽
pp. 4011-4016
2018 ◽
Vol 29
(15)
◽
pp. 12652-12661