scholarly journals Structure, optical simulation and thermal stability of the HfB2-based high-temperature solar selective absorbing coatings

RSC Advances ◽  
2019 ◽  
Vol 9 (51) ◽  
pp. 29726-29733 ◽  
Author(s):  
Xiao-Li Qiu ◽  
Xiang-Hu Gao ◽  
Cheng-Yu He ◽  
Bao-Hui Chen ◽  
Gang Liu
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Transition Metal ◽  
Solar Thermal ◽  
Optical Simulation ◽  
Metal Borides ◽  
Solar Thermal Applications ◽  
Thermal Stability Of

Transition metal borides are a kind of potential materials for high-temperature solar thermal applications.

Nickel nanoparticles individually encapsulated in densified ceramic shells for thermally stable solar energy absorption

2019 ◽  
Vol 7 (7) ◽  
pp. 3039-3045 ◽  
Author(s):  
Dawei Ding ◽  
Kai Liu ◽  
Qikui Fan ◽  
Bitao Dong ◽  
Yang Zhang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Solar Energy ◽  
Energy Absorption ◽  
Nickel Nanoparticles ◽  
Thermal Conversion ◽  
Solar Thermal ◽  
Thermally Stable ◽  
Spectrally Selective ◽  
Thermal Stability Of

Encapsulation of nickel nanoparticles in densified silica nanoshells enhances the thermal stability of spectrally selective absorbers for high-temperature solar-thermal conversion systems.

An investigation of thermal stability of carbon nanofluids for solar thermal applications

2016 ◽  
Vol 157 ◽  
pp. 652-659 ◽  
Author(s):  
Sara Mesgari ◽  
Robert A. Taylor ◽  
Natasha E. Hjerrild ◽  
Felipe Crisostomo ◽  
Qiyuan Li ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Solar Thermal ◽  
Solar Thermal Applications ◽  
Thermal Stability Of

The Ordered Phase Formation in Ti-Al-Ga Alloys

1970 ◽  
Vol 28 ◽  
pp. 440-441
Author(s):  
Shiro Fujishiro ◽  
Harold L. Gegel
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Titanium Alloys ◽  
Growth Kinetics ◽  
Stoichiometric Composition ◽  
Good Potential ◽  
Alpha Titanium ◽  
Cold Rolled ◽  
Kinetics Of ◽  
Thermal Stability Of

Ordered-alpha titanium alloys having a DO19 type structure have good potential for high temperature (600°C) applications, due to the thermal stability of the ordered phase and the inherent resistance to recrystallization of these alloys. Five different Ti-Al-Ga alloys consisting of equal atomic percents of aluminum and gallium solute additions up to the stoichiometric composition, Ti3(Al, Ga), were used to study the growth kinetics of the ordered phase and the nature of its interface.The alloys were homogenized in the beta region in a vacuum of about 5×10-7 torr, furnace cooled; reheated in air to 50°C below the alpha transus for hot working. The alloys were subsequently acid cleaned, annealed in vacuo, and cold rolled to about. 050 inch prior to additional homogenization

Increased Thermal Stability of Co-silicide Using Co-Ta Alloy Films

2001 ◽  
Vol 670 ◽  
Author(s):  
Min-Joo Kim ◽  
Hyo-Jick Choi ◽  
Dae-Hong Ko ◽  
Ja-Hum Ku ◽  
Siyoung Choi ◽  
...  
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Grain Boundary ◽  
Reaction Rate ◽  
Boundary Migration ◽  
Grain Boundary Migration ◽  
Alloy Films ◽  
Post Annealing ◽  
Alloy Process ◽  
Thermal Stability Of

ABSTRACTThe silicidation reactions and thermal stability of Co silicide formed from Co-Ta/Si systems have been investigated. In case of Co-Ta alloy process, the formation of low resistive CoSi2phase is delayed to about 660°C, as compared to conventional Co/Si system. Moreover, the presence of Ta in Co-Ta alloy films reduces the silicidation reaction rate, resulting in the strong preferential orientation in CoSi2 films. Upon high temperature post annealing in the furnace, the sheet resistance of Co-silicide formed from Co/Si systems increases significantly, while that of Co-Ta/Si systems maintains low. This is due to the formation of TaSi2 at the grain boundaries and surface of Co-silicide films, which prevents the grain boundary migration thereby slowing the agglomeration. Therefore, from our research, increased thermal stability of Co-silicide films was successfully obtained from Co-Ta alloy process.

Thermal stability of nickel-cobalt multilayer silicide

2005 ◽  
Vol 891 ◽  
Author(s):  
Kil Jin Han ◽  
Yu Jung Cho ◽  
Soon Young Oh ◽  
Yong Jin Kim ◽  
Won Jae Lee ◽  
...  
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Depth Profile ◽  
Ternary Phase ◽  
Nickel Silicide ◽  
Composition Gradient ◽  
Cobalt Silicide ◽  
Nickel Cobalt ◽  
Thermal Stability Of ◽  
Xps Depth Profile

ABSTRACTIn this study, we have investigated the structure of nickel-cobalt silicide to understand its behavior at high temperature. Nickel-cobalt silicide was formed after two-step RTP at 500°C and 700°C respectively. We could observe by TEM that nickel-cobalt silicide consists of a structure which seems to be a Ni-Co-Si ternary phase. No nickel silicide phases and cobalt silicide phases were detected in nickel-cobalt silicide by XRD. From XPS depth profile, we could confirm that there is a cobalt composition gradient along the silicide.

Thermal stability of high-temperature materials. Part 1

2004 ◽  
Vol 45 (5) ◽  
pp. 327-332 ◽  
Author(s):  
V. V. Kolomeitsev ◽  
S. A. Suvorov ◽  
E. F. Kolomeitseva
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
High Temperature Materials ◽  
Thermal Stability Of
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