Facile and highly efficient fabrication of robust Ag nanowire–elastomer composite electrodes with tailored electrical properties

2018 ◽  
Vol 6 (27) ◽  
pp. 7207-7218 ◽  
Author(s):  
Ming Yang ◽  
Sang Woo Kim ◽  
Shuye Zhang ◽  
Dae Young Park ◽  
Chang-Woo Lee ◽  
...  

3-D mask with a vacuum filtration system allows efficient fabrication of complex Ag nanowire patterns with clear edges.

2016 ◽  
Vol 4 (36) ◽  
pp. 14025-14032 ◽  
Author(s):  
Shasha Xu ◽  
Yanhua Wang ◽  
Yue Zhao ◽  
Weilin Chen ◽  
Jiabo Wang ◽  
...  

We designed and fabricated POM/MOS composite photoelectrodes with light-enhanced conductivity. {Mo132} clusters act as a photo-induced electron acceptor/donor.


RSC Advances ◽  
2015 ◽  
Vol 5 (13) ◽  
pp. 9904-9911 ◽  
Author(s):  
Jinsu Kim ◽  
Wai-Hwa Khoh ◽  
Boon-Hong Wee ◽  
Jong-Dal Hong

A rGO/TiO2 free standing film has been fabricated via a simple and facile vacuum filtration system. The composite electrode showed improved electrochemical properties compared to the pure rGO due to the highly expanded layer-structure.


2013 ◽  
Vol 1577 ◽  
Author(s):  
Aritra Dhar ◽  
T. L. Alford

ABSTRACTHighly transparent composite electrodes made of multilayers of In- and Ga-doped ZnO and Cu (IGZO/Cu/IGZO) thin films (30/3-9/30 nm thick) are deposited onto flexible substrates at room temperature and by using radio frequency magnetron sputtering. The effect of Cu thickness on the electrical and optical properties of the multilayer stack has been studied in accordance with the Cu morphology. The optical and electrical properties of the multilayers are studied with the UV–Vis spectrophotometry, Hall measurement and four point probe analyses. Results are compared with those from a single IGZO layered thin film. The average optical transmittance and sheet resistance both decreases with increase of copper thickness and has been optimized at 6 nm Cu middle layer thickness. The Haacke figure of merit (FOM) has been calculated to evaluate the performance of the films. The highest FOM achieved is 6 x 10-3 Ω-1 for a Cu thickness of 6 nm with a sheet resistance of 12.2 Ω/sq and an average transmittance of 86%. The multilayered thin films are annealed upto 150 °C in vacuum, forming gas and O2 environments and the optical and electrical properties are studied and compared against the as-deposited samples. Thus IGZO/Cu/IGZO multilayer is a promising flexible electrode material for the next-generation flexible optoelectronics.


2017 ◽  
Vol 7 (1) ◽  
Author(s):  
Minoli K. Pathirane ◽  
Hadi Hosseinzadeh Khaligh ◽  
Irene A. Goldthorpe ◽  
William S. Wong

Sign in / Sign up

Export Citation Format

Share Document