scholarly journals Compositionally tunable ternary Bi2(Se1−xTex)3 and (Bi1−ySby)2Te3 thin films via low pressure chemical vapour deposition

2018 ◽  
Vol 6 (29) ◽  
pp. 7734-7739 ◽  
Author(s):  
Sophie L. Benjamin ◽  
C. H. (Kees) de Groot ◽  
Chitra Gurnani ◽  
Samantha L. Hawken ◽  
Andrew L. Hector ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Morphological Control ◽  
Pressure Chemical ◽  
Cvd Growth

[MCl3(EnBu2)3] (M = Sb, Bi; E = Se, Te) enable CVD growth of ternary Bi2(Se1−xTex)3 and (Bi1−ySby)2Te3 thin films with good compositional, structural and morphological control.

Growth and characteristics of β-Ga2O3 thin films on sapphire (0001) by low pressure chemical vapour deposition

Vacuum ◽  
2021 ◽  
Vol 189 ◽  
pp. 110253
Author(s):  
Yujia Jiao ◽  
Qian Jiang ◽  
Junhua Meng ◽  
Jinliang Zhao ◽  
Zhigang Yin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Pressure Chemical

Growth of PbS and CdS thin films by low-pressure chemical vapour deposition using dithiocarbamates

1996 ◽  
Vol 280 (1-2) ◽  
pp. 16-19 ◽  
Author(s):  
N.I. Fainer ◽  
M.L. Kosinova ◽  
Yu.M. Rumyantsev ◽  
E.G. Salman ◽  
F.A. Kuznetsov
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Cds Thin Films

scholarly journals Universal synthesis method for mixed phase TiO2(B)/anatase TiO2 thin films on substrates via a modified low pressure chemical vapour deposition (LPCVD) route

2016 ◽  
Vol 4 (15) ◽  
pp. 5685-5699 ◽  
Author(s):  
Yothin Chimupala ◽  
Patcharanan Junploy ◽  
Trevor Hardcastle ◽  
Aidan Westwood ◽  
Andrew Scott ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Synthesis Method ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Anatase Tio2 ◽  
Mixed Phase ◽  
Tio2 Thin Films ◽  
Pressure Chemical

We present a universal synthesis method for mixed phase TiO2(B)/anatase thin films on any substrate.

scholarly journals Synthesis and characterization of mixed phase anatase TiO2 and sodium-doped TiO2(B) thin films by low pressure chemical vapour deposition (LPCVD)

RSC Advances ◽  
2014 ◽  
Vol 4 (89) ◽  
pp. 48507-48515 ◽  
Author(s):  
Yothin Chimupala ◽  
Geoffrey Hyett ◽  
Robert Simpson ◽  
Robert Mitchell ◽  
Richard Douthwaite ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Anatase Tio2 ◽  
Mixed Phase ◽  
Glass Substrates ◽  
Pressure Chemical

Mixed phase anatase TiO2 and TiO2(B) thin films were synthesized using Low Pressure Chemical Vapour Deposition (LPCVD) onto glass substrates.

scholarly journals Chalcogenoether complexes of Nb(v) thio- and seleno-halides as single source precursors for low pressure chemical vapour deposition of NbS2 and NbSe2 thin films

2017 ◽  
Vol 46 (30) ◽  
pp. 9824-9832 ◽  
Author(s):  
Yao-Pang Chang ◽  
Andrew L. Hector ◽  
William Levason ◽  
Gillian Reid
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Single Source ◽  
Single Source Precursors ◽  
Pressure Chemical

A series of thioether complexes of NbSCl3 has been prepared and selected examples demonstrated as precursors to 3R-NbS2 films; deposition of 2H-NbSe2 from [NbSe2Cl3(SenBu2)] is also reported.

scholarly journals Improved thermoelectric performance of Bi2Se3 alloyed Bi2Te3 thin films via low pressure chemical vapour deposition

2020 ◽  
Vol 848 ◽  
pp. 156523
Author(s):  
Daniel W. Newbrook ◽  
Stephen P. Richards ◽  
Victoria K. Greenacre ◽  
Andrew L. Hector ◽  
William Levason ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Thermoelectric Performance ◽  
Pressure Chemical

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

2004 ◽  
Vol 455-456 ◽  
pp. 112-115
Author(s):  
Luís Pereira ◽  
Hugo Águas ◽  
Leandro Raniero ◽  
Rui Miguel S. Martins ◽  
Elvira Fortunato ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Polycrystalline Silicon ◽  
Growth Process ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Silicon Thin Films ◽  
Pressure Chemical
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