Additive dependent synthesis of bismuth oxybromide composites for photocatalytic removal of the antibacterial agent ciprofloxacin and mechanism insight
Keyword(s):
Bismuth oxybromide composites obtained with TEOA as additive exhibit the highest photocatalytic degradation for CIP under visible light irradiation.
2014 ◽
Vol 29
(20)
◽
pp. 2473-2482
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2013 ◽
Vol 366
◽
pp. 84-91
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