scholarly journals Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit

RSC Advances ◽  
2017 ◽  
Vol 7 (20) ◽  
pp. 12366-12373 ◽  
Author(s):  
Yunfei Luo ◽  
Ling Liu ◽  
Wei Zhang ◽  
Weijie Kong ◽  
Chengwei Zhao ◽  
...  
Keyword(s):  
Near Field ◽  
Resolution Enhancement ◽  
Diffraction Limit ◽  
Plasmonic Lens

The methods for resolution enhancement and proximity correction of plasmonic lens lithography far beyond near field diffraction limit are investigated.

Ultra-broadband unidirectional launching of surface plasmon polaritons by a double-slit structure beyond the diffraction limit

Nanoscale ◽  
2014 ◽  
Vol 6 (22) ◽  
pp. 13487-13493 ◽  
Author(s):  
Jianjun Chen ◽  
Chengwei Sun ◽  
Hongyun Li ◽  
Qihuang Gong
Keyword(s):  
Surface Plasmon ◽  
Surface Plasmon Polaritons ◽  
Near Field ◽  
Diffraction Limit ◽  
Plasmonic Waveguide ◽  
Plasmon Polaritons ◽  
Double Slit

Based on the near-field interference of two slit apertures in a subwavelength plasmonic waveguide, an ultra-broadband unidirectional SPP launcher beyond the diffraction limit was experimentally realized. This ultra-small SPP launcher has important applications in high-integration plasmonic circuits.

scholarly journals Subwavelength Nanostructuring of Gold Films by Apertureless Scanning Probe Lithography Assisted by a Femtosecond Fiber Laser Oscillator

Nanomaterials ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 536 ◽  
Author(s):  
Ignacio Falcón Casas ◽  
Wolfgang Kautek
Keyword(s):  
Fiber Laser ◽  
Near Field ◽  
Diffraction Limit ◽  
High Repetition Rate ◽  
Scanning Probe ◽  
Optical Methods ◽  
Laser Source ◽  
Gold Films ◽  
Laser Oscillator ◽  
Scanning Probe Lithography

Optical methods in nanolithography have been traditionally limited by Abbe’s diffraction limit. One method able to overcome this barrier is apertureless scanning probe lithography assisted by laser. This technique has demonstrated surface nanostructuring below the diffraction limit. In this study, we demonstrate how a femtosecond Yb-doped fiber laser oscillator running at high repetition rate of 46 MHz and a pulse duration of 150 fs can serve as the laser source for near-field nanolithography. Subwavelength features were generated on the surface of gold films down to a linewidth of 10 nm. The near-field enhancement in this apertureless scanning probe lithography setup could be determined experimentally for the first time. Simulations were in good agreement with the experiments. This result supports near-field tip-enhancement as the major physical mechanisms responsible for the nanostructuring.

An overview of structured illumination microscopy: recent advances and perspectives

2021 ◽  
Author(s):  
Krishnendu Samanta ◽  
Joby Joseph
Keyword(s):  
Spatial Frequency ◽  
Basic Principle ◽  
Imaging Techniques ◽  
Resolution Enhancement ◽  
Super Resolution ◽  
Diffraction Limit ◽  
Structured Illumination ◽  
Post Processing ◽  
Structured Illumination Microscopy ◽  
Near Future

Abstract Structured illumination microscopy (SIM) is one of the most significant widefield super-resolution optical imaging techniques. The conventional SIM utilizes a sinusoidal structured pattern to excite the fluorescent sample; which eventually down-modulates higher spatial frequency sample information within the diffraction-limited passband of the microscopy system and provides around two-fold resolution enhancement over diffraction limit after suitable computational post-processing. Here we provide an overview of the basic principle, image reconstruction, technical development of the SIM technique. Nonetheless, in order to push the SIM resolution further towards the extreme nanoscale dimensions, several different approaches are launched apart from the conventional SIM. Among the various SIM methods, some of the important techniques e.g. TIRF, non-linear, plasmonic, speckle SIM etc. are discussed elaborately. Moreover, we highlight different implementations of SIM in various other imaging modalities to enhance their imaging performances with augmented capabilities. Finally, some future outlooks are mentioned which might develop fruitfully and pave the way for new discoveries in near future.

Near-field nonlinear imaging of an anapole mode beyond diffraction limit

2021 ◽  
Author(s):  
Tong Cui ◽  
Mingqian Zhang ◽  
Yun Zhao ◽  
Yuanmu Yang ◽  
Benfeng Bai ◽  
...  
Keyword(s):  
Near Field ◽  
Diffraction Limit ◽  
Nonlinear Imaging

Effect of plasmonic lens distribution on flight characteristics in rotational near-field photolithography

2019 ◽  
Vol 126 (18) ◽  
pp. 183101
Author(s):  
Jiaxin Ji ◽  
Jiying Chen ◽  
Pengfei Xu ◽  
Jing Li ◽  
Yueqiang Hu ◽  
...  
Keyword(s):  
Near Field ◽  
Plasmonic Lens

scholarly journals From Far-Field to Near-Field Micro- and Nanoparticle Optical Trapping

2020 ◽  
Vol 10 (4) ◽  
pp. 1375 ◽  
Author(s):  
Theodoros D. Bouloumis ◽  
Síle Nic Chormaic
Keyword(s):  
Optical Tweezers ◽  
Near Field ◽  
Metallic Nanostructures ◽  
Diffraction Limit ◽  
Submicron Particles ◽  
Great Success ◽  
Laser Illumination ◽  
Minimum Particle Size ◽  
Standard Tool ◽  
Established Technique

Optical tweezers are a very well-established technique that have developed into a standard tool for trapping and manipulating micron and submicron particles with great success in the last decades. Although the nature of light enforces restrictions on the minimum particle size that can be efficiently trapped due to Abbe’s diffraction limit, scientists have managed to overcome this problem by engineering new devices that exploit near-field effects. Nowadays, metallic nanostructures can be fabricated which, under laser illumination, produce a secondary plasmonic field that does not suffer from the diffraction limit. This advance offers a great improvement in nanoparticle trapping, as it relaxes the trapping requirements compared to conventional optical tweezers although problems may arise due to thermal heating of the metallic nanostructures. This could hinder efficient trapping and damage the trapped object. In this work, we review the fundamentals of conventional optical tweezers, the so-called plasmonic tweezers, and related phenomena. Starting from the conception of the idea by Arthur Ashkin until recent improvements and applications, we present the principles of these techniques along with their limitations. Emphasis in this review is on the successive improvements of the techniques and the innovative aspects that have been devised to overcome some of the main challenges.

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