scholarly journals Building with ions: towards direct write of platinum nanostructures using in situ liquid cell helium ion microscopy

Nanoscale ◽  
2017 ◽  
Vol 9 (35) ◽  
pp. 12949-12956 ◽  
Author(s):  
Anton V. Ievlev ◽  
Jacek Jakowski ◽  
Matthew J. Burch ◽  
Vighter Iberi ◽  
Holland Hysmith ◽  
...  
Keyword(s):  
Ion Beam ◽  
Direct Write ◽  
High Chemical ◽  
Liquid Precursor ◽  
Helium Ion ◽  
Liquid Cell ◽  
Chemical Purity ◽  
Ion Microscopy

Direct write with liquid precursor using an helium ion beam, allows fabrication of nanostructures with sub-15 nm resolution and high chemical purity.

scholarly journals Liquid Cell Crystallization and In-situ Imaging of Thiamethoxam by Helium Ion Microscopy

2018 ◽  
Vol 24 (S1) ◽  
pp. 330-331
Author(s):  
Alison Pawlicki ◽  
Matt Bruch ◽  
Anton Ievlev ◽  
Jeff Fowler ◽  
Olga Ovchinnikova ◽  
...  
Keyword(s):  
Helium Ion ◽  
Liquid Cell ◽  
Ion Microscopy ◽  
In Situ Imaging

Fabrication of metrology test structures with helium ion beam direct write

2017 ◽  
Author(s):  
Chien-Lin Lee ◽  
Sheng-Wei Chien ◽  
Sheng-Yung Chen ◽  
Chun-Hung Liu ◽  
Kuen-Yu Tsai ◽  
...  
Keyword(s):  
Ion Beam ◽  
Direct Write ◽  
Helium Ion

scholarly journals Digging gold: keV He+ ion interaction with Au

2013 ◽  
Vol 4 ◽  
pp. 453-460 ◽  
Author(s):  
Vasilisa Veligura ◽  
Gregor Hlawacek ◽  
Robin P Berkelaar ◽  
Raoul van Gastel ◽  
Harold J W Zandvliet ◽  
...  
Keyword(s):  
Ion Beam ◽  
Normal Incidence ◽  
Sample Surface ◽  
Primary Energy ◽  
Periodic Surface ◽  
Helium Bubbles ◽  
Surface Sensitivity ◽  
Helium Ion ◽  
Helium Implantation ◽  
Ion Microscopy

Helium ion microscopy (HIM) was used to investigate the interaction of a focused He+ ion beam with energies of several tens of kiloelectronvolts with metals. HIM is usually applied for the visualization of materials with extreme surface sensitivity and resolution. However, the use of high ion fluences can lead to significant sample modifications. We have characterized the changes caused by a focused He+ ion beam at normal incidence to the Au{111} surface as a function of ion fluence and energy. Under the influence of the beam a periodic surface nanopattern develops. The periodicity of the pattern shows a power-law dependence on the ion fluence. Simultaneously, helium implantation occurs. Depending on the fluence and primary energy, porous nanostructures or large blisters form on the sample surface. The growth of the helium bubbles responsible for this effect is discussed.

Direct observation of structural and defect evolution in C-rich SiC using in situ helium ion microscopy

Nanoscale ◽  
2016 ◽  
Vol 8 (2) ◽  
pp. 762-765 ◽  
Author(s):  
Wen Liu ◽  
Laifei Cheng ◽  
Xiaoqiang Li ◽  
Yiguang Wang
Keyword(s):  
Direct Observation ◽  
Helium Ion ◽  
Microstructural Effects ◽  
Defect Evolution ◽  
Ion Microscopy

The microstructural effects of SiC swelling, mechanisms of He diffusion and aggregation in C-rich SiC are studied using an in situ helium ion microscope.

scholarly journals Building with Ions: Development of In-situ Liquid Cell Microscopy for the Helium Ion Microscope.

2016 ◽  
Vol 22 (S3) ◽  
pp. 754-755
Author(s):  
Vighter Iberi ◽  
Anton Ievlev ◽  
Chance Brown ◽  
Adam J. Rondinone ◽  
David C. Joy ◽  
...  
Keyword(s):  
Helium Ion ◽  
Liquid Cell ◽  
Cell Microscopy

Applications of Ion Microscopy and In Situ Electron Microscopy to the Study of Electronic Materials and Devices

1998 ◽  
Vol 4 (3) ◽  
pp. 308-316 ◽  
Author(s):  
R. Hull ◽  
J. Demarest ◽  
D. Dunn ◽  
E.A. Stach ◽  
Q. Yuan
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Focused Ion Beam ◽  
Electronic Materials ◽  
Ion Beam ◽  
Microscopy Imaging ◽  
Transmission Electron ◽  
In Situ Electron Microscopy ◽  
Ion Microscopy

We discuss the application of ion microscopy and in situ electron microscopy to the study of electronic and optical materials and devices. We demonstrate how the combination of in situ transmission electron microscopy and focused ion beam microscopy provides new avenues for the study for such structures, enabling extension of these techniques to the study of dopant distributions, nanoscale stresses, three-dimensional structural and chemical reconstruction, and real-time evolution of defect microstructure. We also discuss in situ applications of thermal, mechanical, electrical, and optical stresses during transmission electron microscopy imaging.

scholarly journals Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition

Micromachines ◽  
2020 ◽  
Vol 11 (5) ◽  
pp. 527
Author(s):  
Alex Belianinov ◽  
Matthew J. Burch ◽  
Anton Ievlev ◽  
Songkil Kim ◽  
Michael G. Stanford ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Current ◽  
Ion Source ◽  
Direct Write ◽  
Gas Field ◽  
Critical Dimensions ◽  
3D Mesh ◽  
Nanoscale Structures ◽  
Helium Ion

The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.

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