Synthesis, structural characterization and magnetic properties of ordered mesoporous Pr1−xCaxMnO3 thin films

CrystEngComm ◽  
2018 ◽  
Vol 20 (2) ◽  
pp. 245-250 ◽  
Author(s):  
Lidija Androš Dubraja ◽  
Di Wang ◽  
Torsten Brezesinski

Continuous mesoporous praseodymium calcium manganite was prepared in thin-film form using a block copolymer template.

1989 ◽  
Vol 149 ◽  
Author(s):  
Jack L. Stone

ABSTRACTSignificant deployment of the promising option of photovoltaics for energy will require cost-effective technologies that compete effectively with conventional sources. One such option utilizes thin films of a variety of photovoltaic materials. These thin films must be manufacturable in large quantities, and they must have high performance and acceptable reliability. Amorphous silicon (a-Si) was the first successfully demonstrated thin film to be widely adopted by industry. This material is already used to power a larger number of such consumer products as calculators, watches, and battery chargers. Recently, a-Si solar cells have been scaled up to large-area modules for power applications. Large fields of these modules have been deployed by utility companies for their evaluation. Polycrystalline thin films such as copper indium diselenide (CIS) and cadmium telluride (CdTe) have recently shown promise in following the path of a-Si. High-efficiency, large-area submodules have been successfully tested. By combining these materials in hybrid combinations, researchers have demonstrated much higher efficiencies. Even higher efficiencies have been demonstrated with more conventional materials such as silicon and gallium arsenide in thin-film form. Such devices have a high degree of acceptability because of their successful application for power uses in their non-thin-film form. Extensive examples are given to demonstrate the technical viability of these photovoltaic approaches for possible use in utility-scale power plants and in other near-term, highvalue markets.


2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  

MRS Advances ◽  
2016 ◽  
Vol 1 (37) ◽  
pp. 2635-2640 ◽  
Author(s):  
Adele Moatti ◽  
Reza Bayati ◽  
Srinivasa Rao Singamaneni ◽  
Jagdish Narayan

ABSTRACTBi-epitaxial VO2 thin films with [011] out-of-plane orientation were integrated with Si(100) substrates through TiO2/TiN buffer layers. At the first step, TiN is grown epitaxially on Si(100), where a cube-on-cube epitaxy is achieved. Then, TiN was oxidized in-situ ending up having epitaxial r-TiO2. Finally, VO2 was deposited on top of TiO2. The alignment across the interfaces was stablished as VO2(011)║TiO2(110)║TiN(100)║Si(100) and VO2(110) /VO2(010)║TiO2(011)║TiN(112)║Si(112). The inter-planar spacing of VO2(010) and TiO2(011) equal to 2.26 and 2.50 Å, respectively. This results in a 9.78% tensile misfit strain in VO2(010) lattice which relaxes through 9/10 alteration domains with a frequency factor of 0.5, according to the domain matching epitaxy paradigm. Also, the inter-planar spacing of VO2(011) and TiO2(011) equals to 3.19 and 2.50 Å, respectively. This results in a 27.6% compressive misfit strain in VO2(011) lattice which relaxes through 3/4 alteration domains with a frequency factor of 0.57. We studied semiconductor to metal transition characteristics of VO2/TiO2/TiN/Si heterostructures and established a correlation between intrinsic defects and magnetic properties.


2021 ◽  
Author(s):  
Robynne Lynne PALDI ◽  
Xing Sun ◽  
Xin Li Phuah ◽  
Juanjuan Lu ◽  
Xinghang Zhang ◽  
...  

Self-assembled oxide-metallic alloyed nanopillars as hybrid plasmonic metamaterials (e.g., ZnO-AgxAu1-x) in a thin film form are grown using a pulsed laser deposition method. The hybrid films were demonstrated to be...


2018 ◽  
Vol 9 (36) ◽  
pp. 7277-7286 ◽  
Author(s):  
Anna M. Majcher ◽  
Paweł Dąbczyński ◽  
Mateusz M. Marzec ◽  
Magdalena Ceglarska ◽  
Jakub Rysz ◽  
...  

A new material combining polymers and magnetic relaxations both in the bulk solid solution and in the thin film form.


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