Tuning the electrical performance of metal oxide thin-film transistors via dielectric interface trap passivation and graded channel modulation doping
2017 ◽
Vol 5
(5)
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pp. 1206-1215
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Keyword(s):
A novel strategy to achieve high performance thin-film transistors based on carrier concentration-graded InGaZnO channels using Al2O3-passivated HfO2 as a dielectric layer was established.
Keyword(s):
2016 ◽
Vol 4
(47)
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pp. 11298-11304
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Keyword(s):
Keyword(s):
2019 ◽
Vol 7
(25)
◽
pp. 7627-7635
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2014 ◽
Vol 2
(28)
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pp. 5695-5703
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