scholarly journals Essential role of hydride ion in ruthenium-based ammonia synthesis catalysts

2016 ◽  
Vol 7 (7) ◽  
pp. 4036-4043 ◽  
Author(s):  
Masaaki Kitano ◽  
Yasunori Inoue ◽  
Hiroki Ishikawa ◽  
Kyosuke Yamagata ◽  
Takuya Nakao ◽  
...  
Keyword(s):  
Low Temperature ◽  
Essential Role ◽  
Ammonia Synthesis ◽  
Metal Hydrides ◽  
Low Pressure ◽  
Hydride Ion ◽  
Synthesis Catalysts

Ruthenium-loaded metal hydrides with hydrogen vacancies function as efficient catalysts for ammonia synthesis under low temperature and low pressure conditions.

scholarly journals Correction: Essential role of hydride ion in ruthenium-based ammonia synthesis catalysts

2016 ◽  
Vol 7 (8) ◽  
pp. 5596-5596 ◽  
Author(s):  
Masaaki Kitano ◽  
Yasunori Inoue ◽  
Hiroki Ishikawa ◽  
Kyosuke Yamagata ◽  
Takuya Nakao ◽  
...  
Keyword(s):  
Essential Role ◽  
Ammonia Synthesis ◽  
Hydride Ion ◽  
Synthesis Catalysts

Correction for ‘Essential role of hydride ion in ruthenium-based ammonia synthesis catalysts’ by Masaaki Kitano et al., Chem. Sci., 2016, 7, 4036-4043.

The important role of N2H formation energy for low-temperature ammonia synthesis in an electric field

2020 ◽  
Vol 351 ◽  
pp. 119-124 ◽  
Author(s):  
Kota Murakami ◽  
Yuta Tanaka ◽  
Ryuya Sakai ◽  
Kenta Toko ◽  
Kazuharu Ito ◽  
...  
Keyword(s):  
Low Temperature ◽  
Electric Field ◽  
Formation Energy ◽  
Ammonia Synthesis

scholarly journals Novel Essential Role of Ethanol Oxidation Genes at Low Temperature Revealed by Transcriptome Analysis in the Antarctic Bacterium Pseudomonas extremaustralis

PLoS ONE ◽  
2015 ◽  
Vol 10 (12) ◽  
pp. e0145353 ◽  
Author(s):  
Paula M. Tribelli ◽  
Esmeralda C. Solar Venero ◽  
Martiniano M. Ricardi ◽  
Maria Gómez-Lozano ◽  
Laura J. Raiger Iustman ◽  
...  
Keyword(s):  
Low Temperature ◽  
Transcriptome Analysis ◽  
Essential Role ◽  
Ethanol Oxidation ◽  
Antarctic Bacterium ◽  
Pseudomonas Extremaustralis ◽  
The Antarctic

scholarly journals Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas

2002 ◽  
Vol 74 (3) ◽  
pp. 401-405
Author(s):  
Christine Charles
Keyword(s):  
Low Temperature ◽  
Silicon Dioxide ◽  
Compressive Stress ◽  
Structural Properties ◽  
Film Growth ◽  
Low Pressure ◽  
Ion Flux ◽  
High Density ◽  
Silicon Dioxide Films

Good-quality silicon dioxide films have been deposited at low temperature (200 °C) using continuous and pulsed oxygen/silane plasmas coupled in a high-density, low-pressure helicon reactor. Although the total ion flux determines many of the structural properties of the deposited oxide, we have found that silicon-containing ions contribute to the film growth (up to 50 %) and appear to be responsible for the measured compressive stress.

Development of novel low temperature and low pressure ammonia synthesis catalyst

1996 ◽  
Vol 142 (2) ◽  
pp. 209-222 ◽  
Author(s):  
Hua-Zhang Liu ◽  
Xiao-Nian Li ◽  
Zhang-Neng Hu
Keyword(s):  
Low Temperature ◽  
Ammonia Synthesis ◽  
Low Pressure
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