scholarly journals Reversible gel–sol photoswitching with an overcrowded alkene-based bis-urea supergelator

2016 ◽  
Vol 7 (7) ◽  
pp. 4341-4346 ◽  
Author(s):  
Sander J. Wezenberg ◽  
Christelle M. Croisetu ◽  
Marc C. A. Stuart ◽  
Ben L. Feringa

A low-molecular-weight organogel composed of photoresponsive bis-urea gelators can undergo a reversible gel–sol phase transition upon UV irradiation.

2015 ◽  
Vol 6 (30) ◽  
pp. 5362-5368 ◽  
Author(s):  
Qiang Fu ◽  
Thomas G. McKenzie ◽  
Shereen Tan ◽  
Eunhyung Nam ◽  
Greg G. Qiao

A novel tertiary amine catalyst and trithiocarbonate synergistic photo-induced controlled radical polymerization of methacrylates has been realized under mild UV irradiation, yielding polymethacrylates with low molecular weight distributions and excellent end-group fidelity.


1999 ◽  
Vol 13 (14n16) ◽  
pp. 2005-2010 ◽  
Author(s):  
Keishi Negita

Electrorheological (ER) effects in the nematic (Ne), the smectic A (SmA) and the isotropic (Is) phases of octyloxy cyanobiphenyl (8OCB) are studied. When an electric field is applied, a large decrease of the viscosity is observed in the Sm A phase, while in the Ne phase an increase of the viscosity is recognized with an anomalous ER effect near the SmA-Ne phase transition. These behaviors are suggested to be general properties of the liquid crystal exhibiting the phase sequence of SmA-Ne-Is.


Soft Matter ◽  
2018 ◽  
Vol 14 (28) ◽  
pp. 5821-5831 ◽  
Author(s):  
Arunava Maity ◽  
Ananta Dey ◽  
Mrinal Kanti Si ◽  
Bishwajit Ganguly ◽  
Amitava Das

We report here a smart functional low molecular weight gelator (LMWG) L, containing an unusual metal ion coordination site, i.e. “half-crown/two carbonyl”.


1998 ◽  
Vol 10 (1) ◽  
pp. 61-68 ◽  
Author(s):  
Satoshi Akimoto ◽  
Mitsutoshi Jikei ◽  
Masa-Aki Kakimoto

A novel polyamide containing a naphthylurea moiety as the photoreaction site (Np Urea-PA) was synthesized by polycondensation of N-3, 5-dicarboxyphenyl- N′-1-naphthylurea and 4, 4′-oxydianiline (ODA). The model reactions, which consisted of irradiation by UV light of the low molecular weight aromatic ureas and isocyanate, suggested that the photochemistry involves an aromatic isocyanate intermediate. Np Urea-PA acts as the negativeworking resist, by UV irradiation through a quartz mask followed by development using aprotic solvents such as N, N-dimethylacetamide (DMAc). The contrast of the negative tone image was improved by using 20 wt% of p-xylylenediamine ( pXDA) as a crosslinking agent.


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