scholarly journals Atomic layer deposition of vanadium oxides for thin-film lithium-ion battery applications

RSC Advances ◽  
2016 ◽  
Vol 6 (115) ◽  
pp. 114658-114665 ◽  
Author(s):  
Felix Mattelaer ◽  
Kobe Geryl ◽  
Geert Rampelberg ◽  
Thomas Dobbelaere ◽  
Jolien Dendooven ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Lithium Ion Battery ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Vanadium Oxides ◽  
Lithium Insertion ◽  
Layer Deposition ◽  
Wide Range

A wide range of vanadium oxides is demostrated as lithium ion cathodes by a combination of ALD and post-ALD anneal, with lithium insertion capacities up to 1380 mAh cm−3.

Ionic and electronic conductivities of atomic layer deposition thin film coated lithium ion battery cathode particles

RSC Advances ◽  
2016 ◽  
Vol 6 (101) ◽  
pp. 98768-98776 ◽  
Author(s):  
Rajankumar L. Patel ◽  
Jonghyun Park ◽  
Xinhua Liang
Keyword(s):  
Thin Film ◽  
Life Cycle ◽  
Ionic Conductivity ◽  
Atomic Layer Deposition ◽  
Lithium Ion Battery ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Electronic Conductivities ◽  
Improved Performance

The ionic and electronic conductivities of ceria ALD-coated and uncoated LiMn2O4 and LiMn1.5Ni0.5O4 samples were studied. The ionic conductivity of the ceria films resulted in the improved performance and longer life cycle of the CeO2 ALD-coated samples.

scholarly journals Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Energies ◽  
2020 ◽  
Vol 13 (9) ◽  
pp. 2345
Author(s):  
Maxim Maximov ◽  
Denis Nazarov ◽  
Aleksander Rumyantsev ◽  
Yury Koshtyal ◽  
Ilya Ezhov ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Silicon Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition ◽  
Nickel Silicon

Lithium nickelate (LiNiO2) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp2) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)2 precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li2SiO3 and Li2Si2O5 were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO2. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

scholarly journals Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries

Coatings ◽  
2019 ◽  
Vol 9 (5) ◽  
pp. 301 ◽  
Author(s):  
Yury Koshtyal ◽  
Denis Nazarov ◽  
Ilya Ezhov ◽  
Ilya Mitrofanov ◽  
Artem Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Oxygen Plasma ◽  
Active Material ◽  
Specific Capacity ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Cyclic Voltammograms ◽  
X Ray ◽  
Layer Deposition

Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)2) and bis(cyclopentadienyl) nickel(II) (NiCp2) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp2 was 200–300 °C, but the optimal Ni(MeCp)2 growth per ALD cycle was 0.011–0.012 nm for both precursors at 250–300 °C. The films deposited using NiCp2 and oxygen plasma at 300 °C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm3) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28–30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge–discharge curves (U(C)).

Fabrication of 3D Core–Shell Multiwalled Carbon Nanotube@RuO2 Lithium-Ion Battery Electrodes through a RuO2 Atomic Layer Deposition Process

ACS Nano ◽  
2014 ◽  
Vol 9 (1) ◽  
pp. 464-473 ◽  
Author(s):  
Keith E. Gregorczyk ◽  
Alexander C. Kozen ◽  
Xinyi Chen ◽  
Marshall A. Schroeder ◽  
Malachi Noked ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Atomic Layer Deposition ◽  
Lithium Ion Battery ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Deposition Process ◽  
Multiwalled Carbon Nanotube ◽  
Core Shell ◽  
Multiwalled Carbon ◽  
Layer Deposition
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