Understanding the Zr and Si interdispersion in Zr1−xSixO2 mesoporous thin films by using FTIR and XANES spectroscopy

2016 ◽  
Vol 45 (24) ◽  
pp. 9977-9987 ◽  
Author(s):  
Leandro Andrini ◽  
Paula C. Angelomé ◽  
Galo J. A. A. Soler-Illia ◽  
Félix G. Requejo

Zr1−xSixO2 mesoporous oxide thin films were obtained and their interdispersion was demonstrated by careful characterization using spectroscopic techniques.

Small ◽  
2006 ◽  
Vol 2 (8-9) ◽  
pp. 1042-1045 ◽  
Author(s):  
Guillaume Cortial ◽  
Magali Siutkowski ◽  
Frédéric Goettmann ◽  
Audrey Moores ◽  
Cédric Boissière ◽  
...  

ChemNanoMat ◽  
2019 ◽  
Vol 5 (10) ◽  
pp. 1289-1295 ◽  
Author(s):  
M. Constanza Sansierra ◽  
Josefina Morrone ◽  
Franco Cornacchiulo ◽  
M. Cecilia Fuertes ◽  
Paula C. Angelomé

Author(s):  
I. A. Rauf

To understand the electronic conduction mechanism in Sn-doped indium oxide thin films, it is important to study the effect of dopant atoms on the neighbouring indium oxide lattice. Ideally Sn is a substitutional dopant at random indium sites. The difference in valence (Sn4+ replaces In3+) requires that an extra electron is donated to the lattice and thus contributes to the free carrier density. But since Sn is an adjacent member of the same row in the periodic table, the difference in the ionic radius (In3+: 0.218 nm; Sn4+: 0.205 nm) will introduce a strain in the indium oxide lattice. Free carrier electron waves will no longer see a perfect periodic lattice and will be scattered, resulting in the reduction of free carrier mobility, which will lower the electrical conductivity (an undesirable effect in most applications).One of the main objectives of the present investigation is to understand the effects of the strain (produced by difference in the ionic radius) on the microstructure of the indium oxide lattice when the doping level is increased to give high carrier densities. Sn-doped indium oxide thin films were prepared with four different concentrations: 9, 10, 11 and 12 mol. % of SnO2 in the starting material. All the samples were prepared at an oxygen partial pressure of 0.067 Pa and a substrate temperature of 250°C using an Edwards 306 coating unit with an electron gun attachment for heating the crucible. These deposition conditions have been found to give optimum electrical properties in Sn-doped indium oxide films. A JEOL 2000EX transmission electron microscope was used to investigate the specimen microstructure.


2011 ◽  
Vol 26 (9) ◽  
pp. 993-997
Author(s):  
Zhan-Yun HUANG ◽  
Ping LUO ◽  
Di-Hu CHEN

2020 ◽  
Vol 183 ◽  
pp. 05002 ◽  
Author(s):  
Hamza Belkhanchi ◽  
Younes Ziat ◽  
Maryama Hammi ◽  
Charaf Laghlimi ◽  
Abdelaziz Moutcine ◽  
...  

In this study, we have investigated the surface analysis and optoelectronic properties on the synthesis of N-CNT/TiO2 composites thin films, using sol gel method for a dye synthetized solar cell (DSSC) which is found to be simple and economical route. The titanium dioxide based solar cells are an exciting photovoltaic candidate; they are promising for the realization of large area devices. That can be synthetized by room temperature solution processing, with high photoactive performance. In the present work, we stated comparable efficiencies by directing our investigation on obtaining Sol Gel thin films based on N-CNT/TiO2, by dispersing nitrogen (N) doped carbon nanotubes (N-CNTs) powders in titanium tetraisopropoxyde (TTIP). The samples were assessed in terms of optical properties, using UV—visible absorption spectroscopic techniques. After careful analysis of the results, we have concluded that the mentioned route is good and more efficient in terms of optoelectronic properties. The gap of “the neat” 0.00w% N-CNT/TiO2 is of 3eV, which is in a good agreement with similar gap of semiconductors. The incorporated “w%NCNTs” led to diminishing the Eg with increasing N-CNTs amount. These consequences are very encouraging for optoelectronic field.


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