Relationships between the solution and solid-state properties of solution-cast low-k silica thin films

2016 ◽  
Vol 18 (30) ◽  
pp. 20371-20380 ◽  
Author(s):  
Chao-Ching Chiang ◽  
Chien-You Su ◽  
An-Chih Yang ◽  
Ting-Yu Wang ◽  
Wen-Ya Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Physical Properties ◽  
Amorphous Silica ◽  
Morphological Features ◽  
Silica Thin Films ◽  
Different Types ◽  
Solution Cast ◽  
Low K

This paper reports on the fabrication of low-k (amorphous) silica thin films cast from solutions without and with two different types of surfactants (TWEEN® 80 and Triton™ X-100) to elucidate the relationships between the structural/morphological features of the casting solutions and the physical properties of the resulting thin films.

The Preparation and Properties of A New Family of Amorphous Fluoropolymers: Teflon® Af

1989 ◽  
Vol 167 ◽  
Author(s):  
Paul R. Resnick
Keyword(s):  
Thin Films ◽  
Glass Transition ◽  
Thermal Properties ◽  
Physical Properties ◽  
Chemical Resistance ◽  
Transition Temperatures ◽  
Glass Transition Temperatures ◽  
New Family ◽  
The Family ◽  
Solution Cast

AbstractTeflon® AF is a family of amorphous fluoropolymers with glass transition temperatures as high as 300° based on bis-2,2-trfluoromethyl-4,5-difluoro-1,3-dioxole, (I), which has unusual properties [1–3] (Figure 1). The family retains the superior electrical, chemical resistance and thermal properties associated with fluoropolymers. In addition the polymers have high optical clarity, limited solubility in some commercially available perfluorinated ethers such as Fluorinert® FC-75 and improved physical properties below their glass transition temperatures (Figure 2). Teflon® AF polymers may be either solution cast into clear micron thin films or melt processed into a variety of forms.

scholarly journals Aryl substitution of pentacenes

2014 ◽  
Vol 10 ◽  
pp. 1692-1705 ◽  
Author(s):  
Andreas R Waterloo ◽  
Anna-Chiara Sale ◽  
Dan Lehnherr ◽  
Frank Hampel ◽  
Rik R Tykwinski
Keyword(s):  
Thin Films ◽  
Cyclic Voltammetry ◽  
Solid State ◽  
Physical Properties ◽  
X Ray ◽  
X Ray Crystallography ◽  
Vis Spectroscopy ◽  
Solid State Devices ◽  
Pentacene Derivatives

A series of 11 new pentacene derivatives has been synthesized, with unsymmetrical substitution based on a trialkylsilylethynyl group at the 6-position and various aryl groups appended to the 13-position. The electronic and physical properties of the new pentacene chromophores have been analyzed by UV–vis spectroscopy (solution and thin films), thermoanalytical methods (DSC and TGA), cyclic voltammetry, as well as X-ray crystallography (for 8 derivatives). X-ray crystallography has been specifically used to study the influence of unsymmetrical substitution on the solid-state packing of the pentacene derivatives. The obtained results add to our ability to better predict substitution patterns that might be helpful for designing new semiconductors for use in solid-state devices.

Nanoindentation Measurements on Low-k Porous Silica Thin Films Spin Coated on Silicon Substrates

2003 ◽  
Vol 125 (4) ◽  
pp. 361-367 ◽  
Author(s):  
Xiaoqin Huang ◽  
Assimina A. Pelegri
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Young’S Modulus ◽  
Microelectromechanical Systems ◽  
Young's Modulus ◽  
Porous Silica ◽  
Silicon Substrates ◽  
Silica Thin Films ◽  
Low K

MEMS (MicroElectroMechanical Systems) are composed of thin films and composite nanomaterials. Although the mechanical properties of their constituent materials play an important role in controlling their quality, reliability, and lifetime, they are often found to be different from their bulk counterparts. In this paper, low-k porous silica thin films spin coated on silicon substrates are studied. The roughness of spin-on coated porous silica films is analyzed with in-situ imaging and their mechanical properties are determined using nanoindentation. A Berkovich type nanoindenter, of a 142.3 deg total included angle, is used and continuous measurements of force and displacements are acquired. It is shown, that the measured results of hardness and Young’s modulus of these films depend on penetration depth. Furthermore, the film’s mechanical properties are influenced by the properties of the substrate, and the reproduction of the force versus displacement curves depends on the quality of the thin film. The hardness of the studied low-k spin coated silica thin film is measured as 0.35∼0.41 GPa and the Young’s modulus is determined as 2.74∼2.94 GPa.

Off-Stoichiometry Spectroscopic Investigations of Pure Amorphous Silica and N-Doped Silica Thin Films

2013 ◽  
Vol 117 (7) ◽  
pp. 3475-3482 ◽  
Author(s):  
M. Boffelli ◽  
M. Back ◽  
E. Cattaruzza ◽  
F. Gonella ◽  
E. Trave ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Silica ◽  
Spectroscopic Investigations ◽  
Silica Thin Films

scholarly journals Diffusion of Oxygen Molecules in Amorphous Silica Thin Films

1990 ◽  
Vol 54 (2) ◽  
pp. 193-200 ◽  
Author(s):  
Masahiro Susa ◽  
Hideyuki Shinohara ◽  
Kazuhiro Nagata ◽  
Kazuhiro S. Goto
Keyword(s):  
Thin Films ◽  
Amorphous Silica ◽  
Silica Thin Films

scholarly journals Control of the intrinsic microstructure in AP-PECVD synthesised amorphous silica thin films

RSC Advances ◽  
2017 ◽  
Vol 7 (82) ◽  
pp. 52274-52282 ◽  
Author(s):  
F. M. Elam ◽  
B. C. A. M. van der Velden-Schuermans ◽  
S. A. Starostin ◽  
M. C. M. van de Sanden ◽  
H. W. de Vries
Keyword(s):  
Thin Films ◽  
Specific Energy ◽  
Amorphous Silica ◽  
Silica Thin Films ◽  
Silica Encapsulation

The lattice porosity of flexible silica encapsulation films can be regulated by varying the specific energy during the AP-PECVD process.

Systematic positron study of hydrophilicity of the internal pore surface in ordered low-k silica thin films

2003 ◽  
Vol 102 (1-3) ◽  
pp. 403-408 ◽  
Author(s):  
R.Escobar Galindo ◽  
A van Veen ◽  
H Schut ◽  
S.W.H Eijt ◽  
C.V Falub ◽  
...  
Keyword(s):  
Thin Films ◽  
Pore Surface ◽  
Silica Thin Films ◽  
Low K ◽  
Internal Pore
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