Low temperature synthesis of silicon quantum dots with plasma chemistry control in dual frequency non-thermal plasmas
2016 ◽
Vol 18
(23)
◽
pp. 15697-15710
◽
Keyword(s):
The design of advanced plasma processes by plasma and radical control is essential for the controlled low-temperature deposition of different size QDs.
2016 ◽
Vol 49
(39)
◽
pp. 395203
◽
2019 ◽
Vol 476
◽
pp. 757-760
◽
Keyword(s):
2019 ◽
Vol 250
◽
pp. 17-30
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Keyword(s):
2008 ◽
Vol 463
(1-2)
◽
pp. 92-95
◽
2010 ◽
Vol 49
(5)
◽
pp. 05EA03
◽
2011 ◽
Vol 116
(1)
◽
pp. 1185-1194
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Keyword(s):