scholarly journals The effect of a Ta oxygen scavenger layer on HfO2-based resistive switching behavior: thermodynamic stability, electronic structure, and low-bias transport

2016 ◽  
Vol 18 (10) ◽  
pp. 7502-7510 ◽  
Author(s):  
Xiaoliang Zhong ◽  
Ivan Rungger ◽  
Peter Zapol ◽  
Hisao Nakamura ◽  
Yoshihiro Asai ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Resistive Switching ◽  
Thermodynamic Stability ◽  
First Principles ◽  
Switching Behavior ◽  
Oxygen Scavenger ◽  
Resistive Switching Behavior ◽  
Oxide Heterostructures

First-principles modeling shows how resistive switching in oxide heterostructures is improved by inserting an “oxygen scavenger” layer.

Single CuOx Nanowire Memristor: Forming-Free Resistive Switching Behavior

2014 ◽  
Vol 6 (19) ◽  
pp. 16537-16544 ◽  
Author(s):  
Kai-De Liang ◽  
Chi-Hsin Huang ◽  
Chih-Chung Lai ◽  
Jian-Shiou Huang ◽  
Hung-Wei Tsai ◽  
...  
Keyword(s):  
Resistive Switching ◽  
Switching Behavior ◽  
Resistive Switching Behavior

Detection of resistive switching behavior based on the Al 2 O 3 /ZnO/Al 2 O 3 structure with alumina buffers

2017 ◽  
Vol 623 ◽  
pp. 8-13 ◽  
Author(s):  
Q. Qiao ◽  
D. Xu ◽  
Y.W. Li ◽  
J.Z. Zhang ◽  
Z.G. Hu ◽  
...  
Keyword(s):  
Resistive Switching ◽  
Switching Behavior ◽  
Resistive Switching Behavior ◽  
Behavior Based

scholarly journals Effects of the thickness on resistive switching characteristics of CrOx thin films

2016 ◽  
Vol 19 (2) ◽  
pp. 92-100
Author(s):  
Ngoc Kim Pham ◽  
Thang Bach Phan ◽  
Vinh Cao Tran
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Resistive Switching ◽  
High Reliability ◽  
Switching Behavior ◽  
Ftir Analysis ◽  
Resistive Switching Behavior ◽  
Bipolar Resistive Switching ◽  
Structure Surface ◽  
Switching Characteristics

In this study, we have investigated influences of the thickness on the structure, surface morphology and resistive switching characteristics of CrOx thin films prepared by using DC reactive sputtering technique. The Raman and FTIR analysis revealed that multiphases including Cr2O3, CrO2, Cr8O21... phases coexist in the microstructure of CrOx film. It is noticed that the amount of stoichiometric Cr2O3 phase increased significantly as well as the surface morphology were more visible with less voids and more densed particles with larger thickness films. The Ag/CrOx/FTO devices exhibited bipolar resistive switching behavior and high reliability. The resistive switching ratio has decreased slightly with the thickness increments and was best achieved at CrOx – 100 nm devices.

Effect of Oxygen Pressure on the Resistive Switching Behavior of Amorphous Pr0.7Ca0.3MnO3 Films

2013 ◽  
Vol 2 (4) ◽  
pp. P35-P37 ◽  
Author(s):  
T.-G. Seong ◽  
K. Bum Choi ◽  
B. Seok Lee ◽  
B.-Y. Kim ◽  
J.-H. Oh ◽  
...  
Keyword(s):  
Resistive Switching ◽  
Oxygen Pressure ◽  
Switching Behavior ◽  
Resistive Switching Behavior ◽  
Effect Of Oxygen
Sign in / Sign up

Export Citation Format

Share Document