scholarly journals Investigations on HONO formation from photolysis of adsorbed HNO3 on quartz glass surfaces

2016 ◽  
Vol 18 (14) ◽  
pp. 9616-9625 ◽  
Author(s):  
Sebastian Laufs ◽  
Jörg Kleffmann
Keyword(s):  
Quartz Glass ◽  
Significant Source ◽  
Glass Surfaces

HONO formation by photolysis of HNO3 on clean surfaces is no significant source of HONO and NOx in the atmosphere.

scholarly journals Laser Beam Polishing of Quartz Glass Surfaces

2011 ◽  
Vol 12 ◽  
pp. 452-461 ◽  
Author(s):  
Jörg Hildebrand ◽  
Kerstin Hecht ◽  
Jens Bliedtner ◽  
Hartmut Müller
Keyword(s):  
Laser Beam ◽  
Quartz Glass ◽  
Glass Surfaces

Comment on “Investigations on HONO formation from photolysis of adsorbed HNO3 on quartz glass surfaces” by S. Laufs and J. Kleffmann, Phys. Chem. Chem. Phys., 2016, 18, 9616

2018 ◽  
Vol 20 (48) ◽  
pp. 30537-30539 ◽  
Author(s):  
Michael N. Sullivan ◽  
Liang T. Chu ◽  
Lei Zhu
Keyword(s):  
Quartz Glass ◽  
Chem Phys ◽  
Photolysis Rates ◽  
Glass Surfaces ◽  
Insight Into ◽  
Phys Chem Chem Phys

Determination of HNO3 coverage on silica provides insight into different HNO3 surface photolysis rates without and with humidity.

scholarly journals Advanced Analysis of Laser Beam Polishing of Quartz Glass Surfaces

2012 ◽  
Vol 39 ◽  
pp. 277-285 ◽  
Author(s):  
Jörg Hildebrand ◽  
Kerstin Hecht ◽  
Jens Bliedtner ◽  
Hartmut Müller
Keyword(s):  
Laser Beam ◽  
Quartz Glass ◽  
Advanced Analysis ◽  
Glass Surfaces

Kinetics of NO reduction by CO on quartz glass surfaces

Fuel ◽  
1995 ◽  
Vol 74 (3) ◽  
pp. 452-455 ◽  
Author(s):  
Andreas Berger ◽  
Gerd Rotzoll
Keyword(s):  
Quartz Glass ◽  
No Reduction ◽  
No Reduction By Co ◽  
Glass Surfaces ◽  
Kinetics Of

Microgroove Etching with Femtosecond Laser on Quartz Glass Surfaces

2020 ◽  
Vol 40 (23) ◽  
pp. 2314001
Author(s):  
陈亮 Chen Liang ◽  
刘晓东 Liu Xiaodong ◽  
刘静 Liu Jing ◽  
熊政军 Xiong Zhengjun
Keyword(s):  
Femtosecond Laser ◽  
Quartz Glass ◽  
Glass Surfaces

Acquired Factor XI Inhibitors in Two Patients with Hereditary Factor XI Deficiency

1984 ◽  
Vol 51 (03) ◽  
pp. 371-375 ◽  
Author(s):  
Kangathevy Morgan ◽  
Sandra Schiffman ◽  
Donald Feinstein
Keyword(s):  
Protein A ◽  
Lambda Light Chain ◽  
Factor Xi ◽  
Spontaneous Bleeding ◽  
Factor Xi Deficiency ◽  
Hereditary Factor ◽  
Coagulation Mechanism ◽  
Factor Xia ◽  
Polyclonal Igg ◽  
Glass Surfaces

SummaryTwo patients with hereditary factor XI deficiency developed inhibitors following plasma transfusions. Neither had severe spontaneous bleeding. The patients’ plasmas neutralized both factor XI in plasma, purified factor XI, and purified factor XIa. The inhibitor in both patients’ plasmas adsorbed to Protein A- Sepharose. The inhibitors eluted from Protein A-Sepharose were partially neutralized by kappa and lambda light chain antisera indicating that they were polyclonal IgG antibodies. Both inhibitors markedly decreased adsorption of factor XI to glass surfaces. The cleavage of factor XI by trypsin was unaffected by the inhibitors. The lack of severe spontaneous bleeding in both of these patients strongly suggests that an alternate coagulation mechanism bypassing factor XI must compensate for this severe defect.

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