Plasma-induced highly efficient synthesis of boron doped reduced graphene oxide for supercapacitors
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In this work, we presented a novel route to synthesize boron doped reduced graphene oxide (rGO) by using the dielectric barrier discharge (DBD) plasma technology under ambient conditions.
2019 ◽
Vol 5
(2)
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pp. 134-140
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2020 ◽
Vol 55
(12)
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pp. 5203-5210
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2020 ◽
Vol 8
(1)
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pp. 77-81
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2020 ◽
Vol 304
◽
pp. 111884
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