Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

Soft Matter ◽  
2016 ◽  
Vol 12 (11) ◽  
pp. 2914-2922 ◽  
Author(s):  
Lei Wan ◽  
Shengxiang Ji ◽  
Chi-Chun Liu ◽  
Gordon S. W. Craig ◽  
Paul F. Nealey
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Solvent Vapor ◽  
Chemical Pattern

We demonstrate that annealing a thin film of block copolymer in the vapor of a solvent that is selective to one of the blocks can yield block copolymer domains that do not naturally occur in the bulk, and that these domains can be aligned with and registered to an underlying chemical pattern.

Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor

2011 ◽  
Vol 45 (1) ◽  
pp. 292-304 ◽  
Author(s):  
Yasuhiko Tada ◽  
Hiroshi Yoshida ◽  
Yoshihito, Ishida ◽  
Tomoyasu Hirai ◽  
Joan K. Bosworth ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Morphology Control ◽  
Solvent Vapor

scholarly journals Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes

2019 ◽  
Vol 7 (5) ◽  
pp. 1901747
Author(s):  
Nils Demazy ◽  
Cian Cummins ◽  
Karim Aissou ◽  
Guillaume Fleury
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Thin Film Nanostructures

scholarly journals Wet Brush Homopolymers as “Smart Solvents” for Rapid, Large Period Block Copolymer Thin Film Self-Assembly

2020 ◽  
Vol 53 (3) ◽  
pp. 1098-1113 ◽  
Author(s):  
Gregory S. Doerk ◽  
Ruipeng Li ◽  
Masafumi Fukuto ◽  
Kevin G. Yager
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Large Period

Controlled solvent vapor annealing of a high χ block copolymer thin film

2017 ◽  
Vol 19 (4) ◽  
pp. 2805-2815 ◽  
Author(s):  
Ross Lundy ◽  
Shauna P. Flynn ◽  
Cian Cummins ◽  
Susan M. Kelleher ◽  
Maurice N. Collins ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Solvent Vapor ◽  
Wafer Scale ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Wafer scale high χ block copolymer patterning via dynamic solvent vapor annealing.

Chemically directed self-assembly of perpendicularly aligned cylinders by a liquid crystalline block copolymer

2015 ◽  
Vol 3 (12) ◽  
pp. 2837-2847 ◽  
Author(s):  
N. Yamashita ◽  
S. Watanabe ◽  
K. Nagai ◽  
M. Komura ◽  
T. Iyoda ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline ◽  
Microphase Separation ◽  
Thermally Induced ◽  
Multiplication Process

Chemical epitaxy with a density multiplication process was applied to the perpendicularly oriented hexagonal cylinder nanostructure of liquid crystalline block copolymer (PEO-b-PMA(Az)) thin film through thermally induced microphase separation by using a newly designed PMA(Az)24 brush.

Self-assembly morphology effects on the crystallization of semicrystalline block copolymer thin film

2007 ◽  
Vol 126 (10) ◽  
pp. 104902 ◽  
Author(s):  
Yuhan Wei ◽  
Caiyuan Pan ◽  
Binyao Li ◽  
Yanchun Han
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly

scholarly journals Thin Film Self-Assembly of a Silicon-Containing Rod–Coil Liquid Crystalline Block Copolymer

2019 ◽  
Vol 52 (2) ◽  
pp. 679-689 ◽  
Author(s):  
Ling-Ying Shi ◽  
Sangho Lee ◽  
Li-Chen Cheng ◽  
Hejin Huang ◽  
Fen Liao ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline
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