XRD and XPS studies of room temperature spontaneous interfacial reaction of CeO2 thin films on Si and Si3N4 substrates
Keyword(s):
X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) investigations of interfacial reactions between Ce and Si have been carried out on as-deposited and 15 month aged CeO2/Si and CeO2/Si3N4 thin films.