A redox-stable chromate cathode decorated with in situ grown nickel nanocatalyst for efficient carbon dioxide electrolysis

2015 ◽  
Vol 5 (3) ◽  
pp. 1929-1940 ◽  
Author(s):  
Cong Ruan ◽  
Kui Xie

Ni nanoparticles are anchored on the surface of a chromate substrate by in situ growth, and significantly improve its performance for high-temperature CO2 electrolysis.

2014 ◽  
Vol 39 (36) ◽  
pp. 20888-20897 ◽  
Author(s):  
Huaxin Li ◽  
Gehui Sun ◽  
Kui Xie ◽  
Wentao Qi ◽  
Qingqing Qin ◽  
...  

2018 ◽  
Vol 19 (6) ◽  
pp. 1809-1823 ◽  
Author(s):  
Lianfu Li ◽  
Xin Zhang ◽  
Zhendong Luan ◽  
Zengfeng Du ◽  
Shichuan Xi ◽  
...  

RSC Advances ◽  
2014 ◽  
Vol 4 (76) ◽  
pp. 40494-40504 ◽  
Author(s):  
Wentao Qi ◽  
Kui Xie ◽  
Min Liu ◽  
Guojian Wu ◽  
Yan Wang ◽  
...  

In situ growth of Ni nanocatalysts on CeO2 surface has been achieved and the direct carbon dioxide electrolysis reaches high efficiencies using this material as cathode.


2015 ◽  
Vol 5 (3) ◽  
pp. 1588-1597 ◽  
Author(s):  
Zhenxin Xu ◽  
Ning Wang ◽  
Wei Chu ◽  
Jie Deng ◽  
Shizhong Luo

The dual confinement effects from alumina and LDH precursors produced a new nanoplates-on-pore structure with a uniform distribution and smaller size of Ni nanoparticles (NPs) for the LDOs/γ-Al2O3, while enhanced catalytic performance and better resistance to sintering and coking.


2014 ◽  
Vol 4 (1) ◽  
Author(s):  
Haoshan Wei ◽  
Kui Xie ◽  
Jun Zhang ◽  
Yong Zhang ◽  
Yan Wang ◽  
...  

2019 ◽  
Vol 91 (1) ◽  
pp. 1751-1760 ◽  
Author(s):  
Diana María Amaya Dueñas ◽  
Guoxing Chen ◽  
Anke Weidenkaff ◽  
Noriko Sata ◽  
Feng Han ◽  
...  

2014 ◽  
Vol 2 (26) ◽  
pp. 5142-5148 ◽  
Author(s):  
Rajalaxmi Maharana ◽  
M. Manivel Raja ◽  
V. V. Bhanu Prasad ◽  
Pradip Paik ◽  
Subir Roy

Graphitized carbon coated Ni nanoparticles were synthesized in an AlPO4 matrix in situ in an oxidative atmosphere without using any foreign reducing agent.


Author(s):  
N. Rozhanski ◽  
A. Barg

Amorphous Ni-Nb alloys are of potential interest as diffusion barriers for high temperature metallization for VLSI. In the present work amorphous Ni-Nb films were sputter deposited on Si(100) and their interaction with a substrate was studied in the temperature range (200-700)°C. The crystallization of films was observed on the plan-view specimens heated in-situ in Philips-400ST microscope. Cross-sectional objects were prepared to study the structure of interfaces.The crystallization temperature of Ni5 0 Ni5 0 and Ni8 0 Nb2 0 films was found to be equal to 675°C and 525°C correspondingly. The crystallization of Ni5 0 Ni5 0 films is followed by the formation of Ni6Nb7 and Ni3Nb nucleus. Ni8 0Nb2 0 films crystallise with the formation of Ni and Ni3Nb crystals. No interaction of both films with Si substrate was observed on plan-view specimens up to 700°C, that is due to the barrier action of the native SiO2 layer.


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