Formation of interconnected morphologies via nanorod inclusion in the confined assembly of symmetric block copolymers

2014 ◽  
Vol 16 (19) ◽  
pp. 8865-8871 ◽  
Author(s):  
Jay Hoon Park ◽  
Yong Lak Joo

Mesoscale simulations demonstrate that nanorod inclusion in a symmetric block copolymer leads to facile formation of interconnected morphologies under cylindrical confinement.

Soft Matter ◽  
2020 ◽  
Vol 16 (17) ◽  
pp. 4311-4323
Author(s):  
Jingxue Zhang ◽  
Jiaping Wu ◽  
Run Jiang ◽  
Zheng Wang ◽  
Yuhua Yin ◽  
...  

The effects of chain architecture on the structural details and orientation of confined lamellae formed by symmetric AB-type block copolymer melts are studied.


1969 ◽  
Vol 22 (8) ◽  
pp. 1649 ◽  
Author(s):  
JR Urwin

Binary cluster integrals or excluded volumes for chemically different segment pairs in block copolymers of poly(isoprene : styrene) have been calculated from the equation derived by Froelich and Benoit for a two- sequence block copolymer. Expansion factors have been recalculated assuming a linear relation for [η]θ with respect to composition employing published values for polystyrene and polyisoprene. The results are discussed in relation to possible conformations of block copolymers.


2021 ◽  
Author(s):  
Isamu Akiba ◽  
Kazuo Sakurai

AbstractBlock copolymers are well recognized as excellent nanotools for delivering hydrophobic drugs. The formulation of such delivery nanoparticles requires robust characterization and clarification of the critical quality attributes correlating with the safety and efficacy of the drug before applying to regulatory authorities for approval. Static solution scattering from block copolymers is one such technique. This paper first outlines the theoretical background and current models for analyzing this scattering and then presents an overview of our recent studies on block copolymers.


2020 ◽  
Vol 5 (10) ◽  
pp. 1642-1657
Author(s):  
Cian Cummins ◽  
Guillaume Pino ◽  
Daniele Mantione ◽  
Guillaume Fleury

Recently engineered high χ-low N block copolymers for nanolithography are evaluated. Synthetic routes together with thin film processing strategies are highlighted that could enable the relentless scaling for logic technologies at sub-10 nanometres.


Soft Matter ◽  
2011 ◽  
Vol 7 (14) ◽  
pp. 6477 ◽  
Author(s):  
Alejandro Sanz ◽  
Aurora Nogales ◽  
Tiberio A. Ezquerra

2017 ◽  
Vol 8 (34) ◽  
pp. 4983-4987 ◽  
Author(s):  
Jawaher A. Alfurhood ◽  
Hao Sun ◽  
Christopher P. Kabb ◽  
Bryan S. Tucker ◽  
James H. Matthews ◽  
...  

We report nanoassemblies based on block copolymers of N-(2-hydroxypropyl)methacrylamide (HPMA) in which drug cleavage enhances the biological compatibility of the original polymer carrier by regeneration of HPMA units.


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